SCHEMBL64382

SCHEMBL64382

O=C1NC2N(CO)C(=O)N(CO)C2(CO)N1CO

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11720550 0.81
SCHEMBL6293538 0.71 L3MBTL1 (0.30) L3MBTL1
SCHEMBL11719830 0.70 L3MBTL1 (0.47) L3MBTL1
SCHEMBL14350060 0.66 L3MBTL1 (0.33) L3MBTL1
SCHEMBL11716223 0.62 L3MBTL1 (0.38) L3MBTL1
SCHEMBL18106298 0.59
SCHEMBL12418938 0.58 L3MBTL1 (0.56) L3MBTL1
SCHEMBL1711289 0.58 L3MBTL1 (0.45) L3MBTL1
SCHEMBL6902270 0.58 L3MBTL1 (0.37) L3MBTL1
SCHEMBL11716509 0.57 PKM (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1737 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3940747-B1 NOVEL ETCHING PATTERN FORMING METHOD IN SEMICONDUCTOR MANUFACTURING PROCESS YOUNG CHANG CHEMICAL CO LTD (KR) 2026-05-06 EP claimed
EP-4692943-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION Nissan Chemical Corporation (JP) 2026-02-11 EP claimed
US-12510821-B2 Photoresist composition and method of forming photoresist pattern TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-12-30 US claimed
CN-119286525-B Additive for solving TOPCon battery LPCVD double-plug front-side winding enlarging printing and cleaning process 嘉兴市小辰光伏科技有限公司 2025-06-24 CN claimed
CN-119668028-A Negative photoresist composition, application thereof and imaging method 福建泓光半导体材料有限公司 2025-03-21 CN claimed
CN-114990898-B High-elasticity wear-resistant fabric and preparation method thereof 上海宝鸟服饰有限公司 2025-01-24 CN claimed
CN-119307173-A Anti-fog coating for vehicle-mounted camera and preparation method thereof 珠海鸿游新材料科技有限公司 2025-01-14 CN claimed
CN-119286525-A Additive for solving TOPCon battery LPCVD double-plug front-side winding enlarging printing and cleaning process 嘉兴市小辰光伏科技有限公司 2025-01-10 CN claimed
CN-118388168-B Concrete composite additive and preparation method thereof 宁波新力建材科技有限公司 2024-11-22 CN claimed
WO-2024204232-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION 日産化学株式会社 2024-10-03 WO claimed
EP-0202281-A1 ADDITIVE FOR HYDRAULIC CEMENT MIXES. SANDOZ AG (CH) 1986-11-26 EP claimed
US-4608410-A ACRYLAMIDE EMULSION POLYMER CURED WITH GLYCOURIL SCM CORPORATION (US) 1986-08-26 US claimed
US-4606770-A POLY(N-METHYLOL) GLYCOLURIL SANDOZ LTD. (CH) 1986-08-19 US claimed
WO-1986002921-A1 ADDITIVE FOR HYDRAULIC CEMENT MIXES SANDOZ AG (CH) 1986-05-22 WO claimed
EP-0060471-B1 MICROBIOCIDE AND ITS USE RIEDEL-DE HAEN AKTIENGESELLSCHAFT (DE) 1985-02-06 EP claimed
US-4438189-A POLYUNSATURATED COMPOUND, CROSSLINKABLE EPOXY OR METHYLOL COMPOUND HOECHST AKTIENGESELLSCHAFT (DE) 1984-03-20 US claimed
US-4255558-A POLYETHER COPOLYMERS BASED ON TETRAMETHYLOL GLYCOLURIL AND A POLYOL; HEAT FUSION SCM CORPORATION (US) 1981-03-10 US claimed
US-4254235-A USING A POLYMERIC GLYCOLURIL TO CROSSLINK A MATRIX POLYMER SCM CORPORATION (US) 1981-03-03 US claimed
EP-0021770-A1 A thermosetting powder coating composition and process for preparing same SCM CORPORATION (US) 1981-01-07 EP claimed
US-4064191-A Coating composition containing an alkylated glycoluril, a polymeric non-self-crosslinking compound and an acid catalyst AMERICAN CYANAMID COMPANY (US) 1977-12-20 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12510821-B2 Photoresist composition and method of forming photoresist pattern PLOD3, C1R, CNKSR1 L3MBTL1 430/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.