SCHEMBL6445987

SCHEMBL6445987

CC(/N=C/c1ccccc1Oc1ccccc1)c1c(Cl)cc(Cl)cc1Cl

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.49
HPGD P15428 5/20 0.49
HTT P42858 3/20 0.48
LMNA P02545 7/20 0.42
KMT2A Q03164 2/20 0.42
GAA P10253 2/20 0.42
MAPT P10636 4/20 0.41
L3MBTL1 Q9Y468 1/20 0.40
NPSR1 Q6W5P4 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
RHEB Q15382 1/20 0.38
APEX1 P27695 1/20 0.38
PLA2G1B P04054 1/20 0.37
ATG4B Q9Y4P1 1/20 0.37
ALOX12 P18054 2/20 0.36
GPR55 Q9Y2T6 1/20 0.36
CYP1A2 P05177 2/20 0.36
CYP2C9 P11712 2/20 0.36
CYP2C19 P33261 2/20 0.36
ACLY P53396 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6445991 1.00 ALDH1A1 (0.49) ALDH1A1HPGDHTTLMNAKMT2A
SCHEMBL6445990 1.00 ALDH1A1 (0.49) ALDH1A1HPGDHTTLMNAKMT2A
SCHEMBL6442833 0.85 GRIN2D (0.42) ALDH1A1HPGDHTTLMNAKMT2A
SCHEMBL6442838 0.85 GRIN2D (0.42) ALDH1A1HPGDHTTLMNAKMT2A
SCHEMBL6448723 0.82 LMNA (0.47) ALDH1A1HPGDLMNAKMT2AGAA
SCHEMBL5270990 0.81 SMN1; SMN2 (0.41) ALDH1A1HPGDHTTLMNAKMT2A
SCHEMBL5270996 0.81 SMN1; SMN2 (0.41) ALDH1A1HPGDHTTLMNAKMT2A
SCHEMBL5269701 0.79 MAPT (0.49) ALDH1A1HPGDHTTLMNAKMT2A
SCHEMBL5269703 0.79 MAPT (0.49) ALDH1A1HPGDHTTLMNAKMT2A
SCHEMBL5269698 0.79 MAPT (0.49) ALDH1A1HPGDHTTLMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6894190-B2 Process for producing optically active 3,3,3-trifluoro-2-hydroxy-2-methylpropionic acid, and salt thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed