Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 1/20 | 0.51 |
| ▸ | CA1 | P00915 | 2/20 | 0.50 |
| ▸ | CA2 | P00918 | 2/20 | 0.50 |
| ▸ | MMP1 | P03956 | 2/20 | 0.50 |
| ▸ | MMP2 | P08253 | 2/20 | 0.50 |
| ▸ | MMP9 | P14780 | 2/20 | 0.50 |
| ▸ | MMP8 | P22894 | 2/20 | 0.50 |
| ▸ | MMP13 | P45452 | 2/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL27512791 | 0.98 | ALDH1A1 (0.55) | ALDH1A1TSHRHPGDCA1CA2 | |
| Toluene SCHEMBL28390375 | 0.91 | ALDH1A1 (0.47) | ALDH1A1TSHRHPGDMEN1KMT2A | |
| SCHEMBL8432870 | 0.86 | GPR35 (0.53) | ALDH1A1TSHRHPGDCA1CA2 | |
| SCHEMBL28613032 | 0.85 | ALDH1A1 (0.60) | ALDH1A1TSHRHPGDCA1CA2 | |
| SCHEMBL1477561 | 0.84 | ALDH1A1 (0.55) | ALDH1A1TSHRHPGDCA1CA2 | |
| SCHEMBL31628174 | 0.83 | ALDH1A1 (0.58) | ALDH1A1TSHRHPGDCA1CA2 | |
| SCHEMBL9826058 | 0.83 | ALDH1A1 (0.58) | ALDH1A1TSHRHPGDCA1CA2 | |
| SCHEMBL16914877 | 0.82 | CA1 (0.56) | ALDH1A1TSHRHPGDCA1CA2 | |
| SCHEMBL270126 | 0.81 | ALDH1A1 (0.61) | ALDH1A1TSHRHPGDCA1CA2 | |
| SCHEMBL4506185 | 0.81 | ALDH1A1 (0.56) | ALDH1A1TSHRHPGDCA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3363 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122018244-A | Photoetching method for preparing figure edge frame structure in one step | 武汉市太紫微光电科技有限公司 | 2026-05-12 | — | — | CN | claimed |
| US-20250355358-A1 | BOTTOM ANTIREFLECTIVE COATING MATERIALS | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2025-11-20 | — | — | US | claimed |
| CN-118732392-A | Photoresist composition and preparation method thereof | 万华化学集团股份有限公司 | 2024-10-01 | — | — | CN | claimed |
| CN-110119068-B | Positive photosensitive resin composition, insulating film, and image display device | 东友精细化工有限公司 | 2023-03-24 | — | — | CN | claimed |
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | claimed |
| CN-107728428-B | Chemically amplified photosensitive resin composition and insulating film produced therefrom | 东友精细化工有限公司 | 2022-02-08 | — | — | CN | claimed |
| US-20210364922-A1 | UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2021-11-25 | — | — | US | claimed |
| US-11118082-B2 | Composition, insulating material, and method for preparing an insulating material | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2021-09-14 | — | — | US | claimed |
| US-20200285151-A1 | PHOTOSENSITIVE POLYIMIDE COMPOSITIONS | PROMERUS, LLC (US) | 2020-09-10 | — | — | US | claimed |
| WO-2020101673-A1 | INKJET FLUID COMPOSITION | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2020-05-22 | — | — | WO | claimed |
| US-6436606-B1 | POLYMERS AND PHOTORESISTS COATING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-20 | — | — | US | claimed |
| US-6331383-B1 | Patterning method, and method for manufacturing semiconductor device | CANON KABUSHIKI KAISHA (JP) | 2001-12-18 | — | — | US | claimed |
| WO-2001042860-A1 | CREATION OF RESIST STRUCTURES | INFINEON TECHNOLOGIES AG (DE) | 2001-06-14 | — | — | WO | claimed |
| WO-2001042859-A1 | PRODUCTION OF RESIST STRUCTURES | INFINEON TECHNOLOGIES AG (DE) | 2001-06-14 | — | — | WO | claimed |
| EP-0718317-B1 | Photoresist compositions | OLIN MICROELECTRONIC CHEM INC (US) | 2000-02-23 | — | — | EP | claimed |
| EP-0701173-B1 | Method for producing lithographic plates with imaging elements comprising a photosensitive acid precusor | AGFA GEVAERT NV (BE) | 1997-11-12 | — | — | EP | claimed |
| EP-0481788-B1 | Process for preparing ink jet recording head | CANON KK (JP) | 1997-01-02 | — | — | EP | claimed |
| US-5376498-A | Blend of an alkali-soluble resin, compound that generates an acid upon irradiation, functional aromatic compound and a phenolic compound | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-12-27 | — | — | US | claimed |
| EP-0542572-A1 | Negative type radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-05-19 | — | — | EP | claimed |
| EP-0330406-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-08-30 | — | — | EP | claimed |