Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.46 |
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | ADRB2 | P07550 | 8/20 | 0.41 |
| ▸ | ADRB1 | P08588 | 8/20 | 0.41 |
| ▸ | ADRB3 | P13945 | 8/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | APEX1 | P27695 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.40 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.40 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL647275 | 0.95 | TSHR (0.50) | ALDH1A1TSHRCA2CYP3A4ADRB2 | |
| SCHEMBL489146 | 0.93 | ALDH1A1 (0.43) | ALDH1A1TSHRCA2CYP3A4ADRB2 | |
| SCHEMBL30409596 | 0.93 | ALDH1A1 (0.43) | ALDH1A1TSHRCA2CYP3A4ADRB2 | |
| SCHEMBL10963020 | 0.90 | ALDH1A1 (0.50) | ALDH1A1TSHRCA2CYP3A4ADRB2 | |
| SCHEMBL373114 | 0.87 | TSHR (0.48) | ALDH1A1TSHRCA2CYP3A4ADRB2 | |
| SCHEMBL4783599 | 0.84 | TSHR (0.56) | ALDH1A1TSHRCA2CYP3A4POLB | |
| SCHEMBL2531577 | 0.84 | TSHR (0.56) | ALDH1A1TSHRCA2CYP3A4ADRB2 | |
| SCHEMBL36715 | 0.84 | TSHR (0.56) | ALDH1A1TSHRCA2CYP3A4POLB | |
| SCHEMBL29366686 | 0.84 | TSHR (0.56) | ALDH1A1TSHRCA2CYP3A4POLB | |
| Acrylic Acid SCHEMBL27677368 | 0.83 | TSHR (0.42) | ALDH1A1TSHRCA2CYP3A4ADRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 389 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3192815-B1 | HIGH-RECOVERABILITY RESIN PARTICLES AND USE THEREOF | SEKISUI PLASTICS (JP) | 2021-03-31 | — | — | EP | claimed |
| CN-108383948-B | Waterborne photocuring 3D printing material | 湖州吉复新型材料科技有限公司 | 2020-07-24 | — | — | CN | claimed |
| US-10227456-B2 | High-recoverability resin particles of a crosslinked (meth)acrylic acid ester-based resin, and use thereof | SEKISUI PLASTICS CO., LTD. (JP) | 2019-03-12 | — | — | US | claimed |
| US-20170260342-A1 | HIGH-RECOVERABILITY RESIN PARTICLES AND USE THEREOF | SEKISUI PLASTICS CO., LTD. (JP) | 2017-09-14 | — | — | US | claimed |
| EP-3192815-A1 | HIGH-RECOVERABILITY RESIN PARTICLES AND USE THEREOF | Sekisui Plastics Co., Ltd. (JP) | 2017-07-19 | — | — | EP | claimed |
| EP-2277962-B1 | ACTIVE-ENERGY-RAY-CURABLE COATING COMPOSITION, CURED PRODUCT THEREOF, AND NOVEL CURABLE RESIN | DAINIPPON INK & CHEMICALS (JP) | 2013-07-10 | — | — | EP | claimed |
| US-5707543-A | LIGHT SCATTERING AND RADIATION TRANSPARENT MEDIUM ON SUBSTRATES FOR OPTICAL RECORDING MEDIA USING LIQUID CRYSTALS | FUJI XEROX CO., LTD. (JP) | 1998-01-13 | — | — | US | claimed |
| US-20250155808-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2025-05-15 | — | — | US | disclosed |
| EP-4400223-A1 | DIGITAL EMBOSSING CREATION METHOD | Sakata INX Corporation (JP) | 2024-07-17 | — | — | EP | disclosed |
| CN-118339339-A | Sizing agent for inorganic fibers and inorganic fibers | 竹本油脂株式会社 | 2024-07-12 | — | — | CN | disclosed |
| EP-4397726-A1 | PHOTOCURABLE INK COMPOSITION FOR INKJET PRINTING | Sakata INX Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| CN-112912411-B | Photocurable composition, cured film, and laminate | 捷恩智株式会社 | 2024-07-09 | — | — | CN | disclosed |
| US-20240218195-A1 | ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION AND PRINTED MATTER OBTAINED BY PRINTING WITH ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION | SAKATA INX CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| US-6174604-B1 | BINDER COMPRISING A RADICAL POLYMERIZABLE OLIGOMER, A RADICAL POLYMERIZABLE MONOMER, A PHOTOPOLYMERIZATION INITIATOR, AND A SILICONE COMPOUND MODIFIED WITH A GROUP CONTAINING A LONG CHAIN ETHYLENE OXIDE-PROPYLENE OXIDE; SUBMARINE CABLES | THE FURUKAWA ELECTRIC CO., LTD. (JP) | 2001-01-16 | — | — | US | disclosed |
| US-5707543-A | LIGHT SCATTERING AND RADIATION TRANSPARENT MEDIUM ON SUBSTRATES FOR OPTICAL RECORDING MEDIA USING LIQUID CRYSTALS | FUJI XEROX CO., LTD. (JP) | 1998-01-13 | — | — | US | disclosed |
| US-5589237-A | SUBSTRATE WITH RECORDING LAYER CONTAINING SIDE CHAIN LIQUID CRYSTAL COPOLYMER INCLUDING LIQUID CRYSTAL AND NON-LIQUID CRYSTAL MONOMER UNITS CAPABLE OF HYDROGEN BONDING; REPEATEDLY SWITCHABLE BY ACTION OF HEAT, ELECTRICITY, MAGNETISM | FUJI XEROX CO., LTD. (JP) | 1996-12-31 | — | — | US | disclosed |
| EP-0348063-B1 | THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1993-05-26 | — | — | EP | disclosed |
| US-5177171-A | SULFONIC ACID GROUP-CONTAINING POLYURETHANE AND A PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1993-01-05 | — | — | US | disclosed |
| US-5053316-A | THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1991-10-01 | — | — | US | disclosed |
| EP-0348063-A1 | Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1989-12-27 | — | — | EP | disclosed |