Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.45 |
| ▸ | CA2 | P00918 | 1/20 | 0.45 |
| ▸ | ADRB2 | P07550 | 10/20 | 0.44 |
| ▸ | ADRB1 | P08588 | 10/20 | 0.44 |
| ▸ | ADRB3 | P13945 | 10/20 | 0.44 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.43 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.43 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL647274 | 0.95 | ALDH1A1 (0.46) | TSHRALDH1A1CYP3A4CA2ADRB2 | |
| SCHEMBL373114 | 0.92 | TSHR (0.48) | TSHRALDH1A1CYP3A4CA2ADRB2 | |
| SCHEMBL2531577 | 0.88 | TSHR (0.56) | TSHRALDH1A1CYP3A4CA2ADRB2 | |
| SCHEMBL30409596 | 0.87 | ALDH1A1 (0.43) | TSHRALDH1A1CYP3A4CA2ADRB2 | |
| SCHEMBL489146 | 0.87 | ALDH1A1 (0.43) | TSHRALDH1A1CYP3A4CA2ADRB2 | |
| SCHEMBL28606185 | 0.86 | TSHR (0.48) | TSHRALDH1A1CYP3A4CA2ADRB2 | |
| SCHEMBL27383300 | 0.86 | ADRB2 (0.46) | ALDH1A1ADRB2ADRB1ADRB3TDP1 | |
| Acrylic Acid SCHEMBL27677368 | 0.85 | TSHR (0.42) | TSHRALDH1A1CYP3A4CA2ADRB2 | |
| SCHEMBL13147346 | 0.85 | TSHR (0.47) | TSHRALDH1A1CYP3A4CA2ADRB2 | |
| SCHEMBL22667518 | 0.84 | TSHR (0.49) | TSHRALDH1A1CYP3A4ADRB2ADRB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 301 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3192815-B1 | HIGH-RECOVERABILITY RESIN PARTICLES AND USE THEREOF | SEKISUI PLASTICS (JP) | 2021-03-31 | — | — | EP | claimed |
| US-10227456-B2 | High-recoverability resin particles of a crosslinked (meth)acrylic acid ester-based resin, and use thereof | SEKISUI PLASTICS CO., LTD. (JP) | 2019-03-12 | — | — | US | claimed |
| US-20170260342-A1 | HIGH-RECOVERABILITY RESIN PARTICLES AND USE THEREOF | SEKISUI PLASTICS CO., LTD. (JP) | 2017-09-14 | — | — | US | claimed |
| EP-3192815-A1 | HIGH-RECOVERABILITY RESIN PARTICLES AND USE THEREOF | Sekisui Plastics Co., Ltd. (JP) | 2017-07-19 | — | — | EP | claimed |
| EP-2277962-B1 | ACTIVE-ENERGY-RAY-CURABLE COATING COMPOSITION, CURED PRODUCT THEREOF, AND NOVEL CURABLE RESIN | DAINIPPON INK & CHEMICALS (JP) | 2013-07-10 | — | — | EP | claimed |
| US-5707543-A | LIGHT SCATTERING AND RADIATION TRANSPARENT MEDIUM ON SUBSTRATES FOR OPTICAL RECORDING MEDIA USING LIQUID CRYSTALS | FUJI XEROX CO., LTD. (JP) | 1998-01-13 | — | — | US | claimed |
| US-20250155808-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2025-05-15 | — | — | US | disclosed |
| CN-119744288-A | Curable inkjet composition for manufacturing printed circuit boards | 爱克发-格法特公司 | 2025-04-01 | — | — | CN | disclosed |
| EP-4400223-A1 | DIGITAL EMBOSSING CREATION METHOD | Sakata INX Corporation (JP) | 2024-07-17 | — | — | EP | disclosed |
| EP-4397726-A1 | PHOTOCURABLE INK COMPOSITION FOR INKJET PRINTING | Sakata INX Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-20240218195-A1 | ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION AND PRINTED MATTER OBTAINED BY PRINTING WITH ELECTRON BEAM-CURABLE PRINTING INK COMPOSITION | SAKATA INX CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-4394122-A1 | SIZING AGENT FOR INORGANIC FIBER AND INORGANIC FIBER | Takemoto Yushi Kabushiki Kaisha (JP) | 2024-07-03 | — | — | EP | disclosed |
| EP-4394005-A1 | BINDER FOR AQUEOUS INKJET INKS, AQUEOUS INKJET INK, AND PRINTED LAYER | DIC Corporation (JP) | 2024-07-03 | — | — | EP | disclosed |
| US-5589237-A | SUBSTRATE WITH RECORDING LAYER CONTAINING SIDE CHAIN LIQUID CRYSTAL COPOLYMER INCLUDING LIQUID CRYSTAL AND NON-LIQUID CRYSTAL MONOMER UNITS CAPABLE OF HYDROGEN BONDING; REPEATEDLY SWITCHABLE BY ACTION OF HEAT, ELECTRICITY, MAGNETISM | FUJI XEROX CO., LTD. (JP) | 1996-12-31 | — | — | US | disclosed |
| EP-0669548-A1 | Optical element and process for producing the same | FUJI XEROX CO., LTD. (JP) | 1995-08-30 | — | — | EP | disclosed |
| US-5384380-A | Polymerizable compositions and high refractive plastic lens obtained therefrom | DAISO CO., LTD. (JP) | 1995-01-24 | — | — | US | disclosed |
| EP-0606905-A2 | Polymerizable compositions and high refractive plastic lens obtained therefrom | DAISO CO., LTD. (JP) | 1994-07-20 | — | — | EP | disclosed |
| EP-0348063-B1 | THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1993-05-26 | — | — | EP | disclosed |
| US-5177171-A | SULFONIC ACID GROUP-CONTAINING POLYURETHANE AND A PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1993-01-05 | — | — | US | disclosed |
| US-5053316-A | THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1991-10-01 | — | — | US | disclosed |