⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL249241 | 0.88 | — | — | |
| SCHEMBL648680 | 0.82 | — | — | |
| SCHEMBL647684 | 0.82 | — | — | |
| SCHEMBL26667621 | 0.79 | — | — | |
| SCHEMBL1025141 | 0.77 | — | — | |
| SCHEMBL9238426 | 0.77 | — | — | |
| SCHEMBL9123116 | 0.75 | — | — | |
| SCHEMBL27813 | 0.75 | — | — | |
| SCHEMBL34977 | 0.75 | — | — | |
| SCHEMBL647513 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 368 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| US-10985013-B2 | Method and precursors for manufacturing 3D devices | VERSUM MATERIALS US, LLC (US) | 2021-04-20 | — | — | US | claimed |
| CN-105845549-B | Method and precursor for manufacturing 3D devices | 弗萨姆材料美国有限责任公司 | 2020-03-03 | — | — | CN | claimed |
| US-20190304775-A1 | Method and Precursors for Manufacturing 3D Devices | VERSUM MATERIALS US, LLC (US) | 2019-10-03 | — | — | US | claimed |
| US-10354860-B2 | Method and precursors for manufacturing 3D devices | VERSUM MATERIALS US, LLC (US) | 2019-07-16 | — | — | US | claimed |
| US-20180047898-A1 | PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY | AIR PRODUCTS AND CHEMICALS, INC. | 2018-02-15 | — | — | US | claimed |
| US-20160225616-A1 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-08-04 | — | — | US | claimed |
| EP-3051001-A2 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-08-03 | — | — | EP | claimed |
| EP-1482070-B1 | MECHANICAL ENHANCER ADDITIVES FOR LOW DIELECTRIC FILMS | AIR PROD & CHEM (US) | 2015-11-11 | — | — | EP | claimed |
| US-8137764-B2 | organosilicate film formed by plasma-enhanced chemical vapor deposition from a first silicon-containing precursor that comprises from 3 to 4 Si O bonds per Si atom, from 0 to 1 of Si H, Si Br, and Si Cl bonds per Si atom and a second silicon-containing precursor comprises at least one Si C bond per Si | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-03-20 | — | — | US | claimed |
| US-7875317-B2 | formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors | JSR CORPORATION (JP) | 2011-01-25 | — | — | US | claimed |
| CN-101441415-A | Antireflective coatings | AIR PROD & CHEM (US) | 2009-05-27 | — | — | CN | claimed |
| US-20090096106-A1 | ANTIREFLECTIVE COATINGS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-04-16 | — | — | US | claimed |
| EP-2048700-A2 | Antireflective coatings | Air Products and Chemicals, Inc. (US) | 2009-04-15 | — | — | EP | claimed |
| US-20080246153-A1 | ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2008-10-09 | — | — | US | claimed |
| US-7399715-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2008-07-15 | — | — | US | claimed |
| CN-1311097-C | Mechanical enhancer additives for low dielectric films | AIR PROD & CHEM (US) | 2007-04-18 | — | — | CN | claimed |
| CN-1576390-A | Mechanical enhancer additives for low dielectric films | AIR PROD & CHEM (US) | 2005-02-09 | — | — | CN | claimed |
| US-20040241463-A1 | Mechanical enhancer additives for low dielectric films | VERSUM MATERIALS US, LLC | 2004-12-02 | — | — | US | claimed |
| EP-1482070-A1 | Mechanical enhancer additives for low dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-12-01 | — | — | EP | claimed |