⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5672630 | 0.84 | — | — | |
| SCHEMBL648046 | 0.82 | — | — | |
| SCHEMBL249241 | 0.79 | — | — | |
| SCHEMBL646648 | 0.78 | CA1 (0.30) | — | |
| SCHEMBL249445 | 0.76 | — | — | |
| SCHEMBL248851 | 0.73 | — | — | |
| SCHEMBL647684 | 0.73 | — | — | |
| SCHEMBL10887830 | 0.72 | — | — | |
| SCHEMBL26667621 | 0.71 | — | — | |
| SCHEMBL26667651 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 215 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8298965-B2 | Volatile precursors for deposition of C-linked SiCOH dielectrics | AMERICAN AIR LIQUIDE, INC. (US) | 2012-10-30 | — | — | US | claimed |
| US-8026035-B2 | Organosilicon polymer containing chromogen; antireflactivity coating for lithography | CHEIL INDUSTRIES, INC. (KR) | 2011-09-27 | — | — | US | claimed |
| EP-1756123-B1 | PROCESS FOR MAKING HALOORGANOALKOXYSILANES | MOMENTIVE PERFORMANCE MAT INC (US) | 2010-07-28 | — | — | EP | claimed |
| US-20100052115-A1 | Volatile Precursors for Deposition of C-Linked SiCOH Dielectrics | AMERICAN AIR LIQUIDE, INC. (US) | 2010-03-04 | — | — | US | claimed |
| US-20080241748-A1 | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same | CHEIL INDUSTRIES, INC. (KR) | 2008-10-02 | — | — | US | claimed |
| EP-1756123-A1 | PROCESS FOR MAKING HALOORGANOALKOXYSILANES | GENERAL ELECTRIC COMPANY (US) | 2007-02-28 | — | — | EP | claimed |
| WO-2005118598-A1 | PROCESS FOR MAKING HALOORGANOALKOXYSILANES | GENERAL ELECTRIC COMPANY (US) | 2005-12-15 | — | — | WO | claimed |
| US-6872845-B2 | Process for making haloorganoalkoxysilanes | GENERAL ELECTRIC COMPANY (US) | 2005-03-29 | — | — | US | claimed |
| US-20040176627-A1 | Process for making haloorganoalkoxysilanes | CROMPTON CORPORATION | 2004-09-09 | — | — | US | claimed |
| US-20040092759-A1 | Process for making haloalkylalkoxysilanes | MOMENTIVE PERFORMANCE MATERIALS INC. | 2004-05-13 | — | — | US | claimed |
| US-12346026-B2 | Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device | FUJIFILM CORPORATION (JP) | 2025-07-01 | — | — | US | disclosed |
| US-20220252985-A1 | COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-08-11 | — | — | US | disclosed |
| CN-114269567-A | Polymer composition, crosslinked polymer, and tire | JSR株式会社 | 2022-04-01 | — | — | CN | disclosed |
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| US-5250646-A | Reacting disilane with organometallic compound | WACKER-CHEMIE GMBH (DE) | 1993-10-05 | — | — | US | disclosed |
| US-5166287-A | Reaction of a disilane to form polysiloxanes | WACKER-CHEMIE GMBH (DE) | 1992-11-24 | — | — | US | disclosed |
| EP-0486946-A2 | Process for the production of metallopolysilanes and their use | Wacker-Chemie GmbH (DE) | 1992-05-27 | — | — | EP | disclosed |
| EP-0463624-A2 | Process for preparing organopolysilanes | WACKER-CHEMIE GMBH (DE) | 1992-01-02 | — | — | EP | disclosed |