Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | TP53 | P04637 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | ELANE | P08246 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | RELA | Q04206 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | ESR1 | P03372 | 1/20 | 0.31 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.31 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29900 | 0.91 | LTA4H (0.37) | LTA4HALDH1A1TP53NPC1RAB9A | |
| SCHEMBL28911822 | 0.90 | LTA4H (0.31) | LTA4HALDH1A1TP53NPC1RAB9A | |
| SCHEMBL4855961 | 0.90 | NPSR1 (0.32) | LTA4HALDH1A1TP53NPC1RAB9A | |
| SCHEMBL646601 | 0.90 | LTA4H (0.31) | LTA4HALDH1A1TP53NPC1RAB9A | |
| SCHEMBL6373874 | 0.89 | LTA4H (0.36) | LTA4HALDH1A1TP53NPC1RAB9A | |
| SCHEMBL8415484 | 0.88 | LTA4H (0.35) | LTA4HALDH1A1TP53NPC1RAB9A | |
| SCHEMBL10495731 | 0.88 | LTA4H (0.35) | LTA4HALDH1A1TP53NPC1RAB9A | |
| Ammonia Solution, Strong SCHEMBL28965973 | 0.88 | LTA4H (0.35) | LTA4HALDH1A1TP53NPC1RAB9A | |
| Water SCHEMBL27611436 | 0.88 | LTA4H (0.35) | LTA4HALDH1A1TP53NPC1RAB9A | |
| Methane SCHEMBL27804293 | 0.88 | LTA4H (0.35) | LTA4HALDH1A1TP53NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 152 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1520891-B1 | FILM FORMING COMPOSITION, PROCESS FOR PRODUCING FILM FORMING COMPOSITION, INSULATING FILM FORMING MATERIAL, PROCESS FOR FORMING FILM, AND SILICA-BASED FILM | JSR CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-9048175-B2 | Diffusion-agent composition for forming an impurity-diffusing agent layer on a semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140227865-A1 | DIFFUSION-AGENT COMPOSITION, METHOD FOR FORMING IMPURITY-DIFFUSION LAYER, AND SOLAR CELL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-14 | — | — | US | disclosed |
| EP-1746122-B1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-8450045-B2 | Pattern forming method | JSR CORPORATION (JP) | 2013-05-28 | — | — | US | disclosed |
| EP-1705207-B1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR CORP (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-8268403-B2 | Curing a coating of a siloxane compound and a carbosilane compound using ultraviolet radiation; a low relative dielectric constant, excellent chemical resistance, plasma resistance, mechanical strength | JSR CORPORATION (JP) | 2012-09-18 | — | — | US | disclosed |
| US-20120122036-A1 | PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2012-05-17 | — | — | US | disclosed |
| US-8173348-B2 | Method of forming pattern and composition for forming of organic thin-film for use therein | JSR CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| US-4197384-A | Stabilized polycarbonate compositions | GENERAL ELECTRIC COMPANY (US) | 1980-04-08 | — | — | US | disclosed |