Vinyl Ether

Vinyl Ether

SCHEMBL65093

C=COC=C.OC1CCC(O)CC1

nearest known ligand 0.37

Full drug profile on Sugi Atlas →

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.37
EPHX2 P34913 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclohexanol SCHEMBL1538246 0.86 TSHR (0.53) TSHR
Vinyl Ether SCHEMBL28133834 0.85
Cyclohexanol SCHEMBL27597039 0.82 TSHR (0.48) TSHR
Vinyl Ether SCHEMBL18258506 0.82
Vinyl Ether SCHEMBL17912886 0.78 SHBG (0.32)
Vinyl Ether SCHEMBL4434584 0.78 TSHR (0.36) TSHR
Vinyl Ether SCHEMBL27684877 0.77 CA1 (0.38) TSHR
Vinyl Ether SCHEMBL3914199 0.77 ESR2 (0.32)
Butadiene SCHEMBL5707271 0.76 TSHR (0.44) TSHREPHX2
Inositol SCHEMBL18335393 0.76 LMNA (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1158 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116469997-A Positive electrode current collector containing UV curing layer for lithium battery and preparation method thereof 湖州南木纳米科技有限公司 2023-07-21 CN claimed
CN-116178675-A Novel aqueous epoxy ester and preparation method thereof 山东奔腾漆业股份有限公司 2023-05-30 CN claimed
CN-109852193-B Water-based epoxy resin and preparation method thereof 浙江中科立德新材料有限公司 2021-01-12 CN claimed
CN-109694639-B Water-based glass baking paint and preparation method thereof 浙江中科立德新材料有限公司 2021-01-12 CN claimed
CN-108271380-B Antifouling composition 佐敦公司 2020-10-23 CN claimed
CN-111087544-A Marine polysaccharide water-based resin and preparation method thereof 浙江中科立德新材料有限公司 2020-05-01 CN claimed
CN-1692314-B Chemical-amplification positive-working photoresist composition TOKYO OHKA KOGYO CO LTD 2011-08-31 CN claimed
US-5939235-A PHOTOSENSITIVE CURING AGENTS HAVING AT LEAST TWO ENOL ETHER GROUPS; PERMITING THE USE OF LIGHT RAYS EXTENDING OVER A WIDE RANGE OF WAVELENGTH, PROVIDING CLEAR POSITIVE IMAGES AND A WIDE DEVELOPMENT LATITUDE FUJI PHOTO FILM CO., LTD. (JP) 1999-08-17 US claimed
US-5364738-A Divinyl ethers, solubility in developers FUJI PHOTO FILM CO., LTD. (JP) 1994-11-15 US claimed
JP-5186383-A None JP disclosed
WO-2024143461-A1 LAMINATE, ELECTRONIC DEVICE, COVER GLASS, AND RESIN COMPOSITION 積水化学工業株式会社 2024-07-04 WO disclosed
CN-118284511-A Laminate and electronic device 积水化学工业株式会社 2024-07-02 CN disclosed
WO-2024135086-A1 PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE 株式会社ダイセル 2024-06-27 WO disclosed
US-20240210817-A1 RESIN MOLDED ARTICLE PRODUCTION METHOD AND OPTICAL COMPONENT PRODUCTION METHOD DAICEL CORPORATION (JP) 2024-06-27 US disclosed
US-5637428-A POSITIVE WORKING PHOTOSENSITIVE COMPOSITION FUJI PHOTO FILM CO., LTD. (JP) 1997-06-10 US disclosed
EP-0702271-A1 Positive working printing plate FUJI PHOTO FILM CO., LTD. (JP) 1996-03-20 EP disclosed
US-5364738-A Divinyl ethers, solubility in developers FUJI PHOTO FILM CO., LTD. (JP) 1994-11-15 US disclosed
EP-0609684-A1 Positive-working light-sensitive composition Fuji Photo Film Co., Ltd. (JP) 1994-08-10 EP disclosed
JP-H05186383-A 1,4-CYCLOHEXANEDIOL MONOVINYL ETHER NIPPON CARBIDE IND CO INC 1993-07-27 JP disclosed
EP-0536690-A1 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1993-04-14 EP disclosed