SCHEMBL6522592

SCHEMBL6522592

CCO[Si](CCCN)(OCC)OCC.CCO[Si](CCCS)(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6274065 0.93 LMNA (0.33)
SCHEMBL18080 0.89 DNM1 (0.33)
SCHEMBL4804565 0.89 DNM1 (0.33)
SCHEMBL25427601 0.89
SCHEMBL15541 0.89
Ethylenediamine SCHEMBL28472927 0.88
Water SCHEMBL2514552 0.87 CYP1A2 (0.32)
SCHEMBL9841633 0.87
SCHEMBL22612238 0.87
SCHEMBL19874458 0.87 CYP1A2 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1516747-A1 Planographic printing plate precursor, substrate for the same and surface hydrophilic material FUJI PHOTO FILM CO., LTD. (JP) 2005-03-23 EP disclosed
EP-1304229-A2 Hydrophilic member, hydrophilic graft polymer, and support of planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-04-23 EP disclosed
EP-0607213-B1 COMPOSITE MATERIALS CONTAINING NANOSCALAR PARTICLES, PROCESS FOR PRODUCING THEM AND THEIR USE FOR OPTICAL COMPONENTS INST NEUE MAT GEMEIN GMBH (DE) 1997-01-02 EP disclosed
EP-0607213-A1 COMPOSITE MATERIALS CONTAINING NANOSCALAR PARTICLES, PROCESS FOR PRODUCING THEM AND THEIR USE FOR OPTICAL COMPONENTS. INST NEUE MAT GEMEIN GMBH (DE) 1994-07-27 EP disclosed
WO-1993007179-A2 COMPOSITE MATERIALS CONTAINING NANOSCALAR PARTICLES, PROCESS FOR PRODUCING THEM AND THEIR USE FOR OPTICAL COMPONENTS Institut für Neue Materialien Gemeinnützige GmbH (DE) 1993-04-15 WO disclosed