SCHEMBL6523362

SCHEMBL6523362

CC(C)c1cc(C(C)(C)c2cc(C(C)C)c(N)c(C(C)C)c2)cc(C(C)C)c1N

nearest known ligand 0.38

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
RORC P51449 1/20 0.37
POLB P06746 2/20 0.34
ALDH1A1 P00352 1/20 0.33
CYP3A4 P08684 1/20 0.33
HPGD P15428 1/20 0.33
ALOX15 P16050 1/20 0.33
TSHR P16473 1/20 0.33
ALOX12 P18054 1/20 0.33
CASP1 P29466 1/20 0.33
RECQL P46063 1/20 0.33
HIF1A Q16665 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
GAA P10253 1/20 0.31
GFER P55789 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6861064 0.89 POLB (0.45) RORCPOLBALDH1A1CYP3A4HPGD
SCHEMBL16451462 0.88 ESR1 (0.44) RORCCYP3A4HPGDTSHRHIF1A
SCHEMBL8845943 0.88 ESR1 (0.42) RORCALDH1A1CYP3A4
SCHEMBL8845408 0.86 POLB (0.50) POLBGAA
SCHEMBL11022582 0.80 ESR1 (0.39) RORCPOLBALDH1A1CYP3A4
SCHEMBL9861275 0.79 PDE2A (0.36) ALDH1A1TSHR
SCHEMBL9618626 0.77 SHBG (0.38) ALDH1A1CYP3A4ALOX15CASP1HIF1A
SCHEMBL299993 0.76 CA1 (0.58) RORCALDH1A1CYP3A4HPGDALOX15
SCHEMBL7641269 0.76 RORC (0.46) RORCPOLBALDH1A1CYP3A4HPGD
SCHEMBL9684264 0.76 POLB (0.61) POLBALDH1A1CYP3A4TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130165603-A1 Adhesive Composition And Adhesive Film Comprising The Same CHEIL INDUSTRIES, INC. (KR) 2013-06-27 US claimed
US-20250326948-A1 COATING KIT AND METHOD FOR REPAIR AND/OR RECONSTITUTION OF RUBBER AND/OR METAL WORN AREAS BERTECH PANAMA S A (PA) 2025-10-23 US disclosed
WO-2024052724-A1 COATING KIT AND METHOD FOR REPAIR AND/OR RECONSTITUTION OF RUBBER AND/OR METAL WORN AREAS BERTECH PANAMÁ S.A. (PA) 2024-03-14 WO disclosed
US-9957425-B2 Adhesive composition for semiconductor and adhesive film including the same CHEIL INDUSTRIES, INC. (KR) 2018-05-01 US disclosed
US-9169425-B2 Adhesive film and electronic device including the same CHEIL INDUSTRIES, INC. (KR) 2015-10-27 US disclosed
US-9109147-B2 Adhesive composition for semiconductor and adhesive film comprising the same CHEIL INDUSTRIES, INC. (KR) 2015-08-18 US disclosed
US-8946343-B2 Adhesive composition for semiconductors, adhesive film prepared using the same, and semiconductor device including the film CHEIL INDUSTRIES, INC. (KR) 2015-02-03 US disclosed
US-20140194555-A1 ADHESIVE COMPOSITION FOR SEMICONDUCTOR AND ADHESIVE FILM INCLUDING THE SAME CHEIL INDUSTRIES, INC. (KR) 2014-07-10 US disclosed
US-20140186607-A1 ADHESIVE COMPOSITION FOR A SEMICONDUCTOR, ADHESIVE FILM PREPARED FROM THE COMPOSITION, AND SEMICONDUCTOR DEVICE CONNECTED BY THE FILM CHEIL INDUSTRIES, INC. (KR) 2014-07-03 US disclosed
US-20130281559-A1 ADHESIVE COMPOSITION FOR SEMICONDUCTOR AND ADHESIVE FILM COMPRISING THE SAME CHEIL INDUSTRIES, INC. (KR) 2013-10-24 US disclosed
US-6046072-A BONDING A SEMICONDUCTOR CHIP TO A LEAD FRAME WITH ADHESIVE MEMBER HAVING LOW MOISTURE ABSORBING, LOW FLOW ADHESIVE AND ENCAPSULATING PACKAGE WITH SEALANT HITACHI CHEMICAL COMPANY, LTD. (JP) 2000-04-04 US disclosed
EP-0618614-B1 Heat-resistant adhesive for the fabrication of a semiconductor package HITACHI CHEMICAL CO LTD (JP) 1999-01-07 EP disclosed
EP-0862205-A1 Heat-resistant adhesive HITACHI CHEMICAL CO., LTD. (JP) 1998-09-02 EP disclosed
EP-0538850-B1 New polyurea resins and their preparation and use IHARA CHEMICAL IND CO (JP) 1997-01-22 EP disclosed
EP-0618614-A2 Heat-resistant adhesive for the fabrication of a semiconductor package Hitachi Chemical Co., Ltd. (JP) 1994-10-05 EP disclosed
US-5319058-A Improved heat resistance when polyisocyanate component is a combination of an aliphatic diisocyanate and a cyclic trimer of an aliphatic polyisocyanate IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 1994-06-07 US disclosed
EP-0279376-B1 Process for producing polyurea resin IHARA CHEMICAL IND CO (JP) 1993-11-03 EP disclosed
EP-0538850-A2 New polyurea resins and their preparation and use IHARA CHEMICAL INDUSTRY Co., Ltd. (JP) 1993-04-28 EP disclosed
US-5086153-A Reacting aromatic polyamine, specific aminobenzoate derivative and polyisocyanate IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 1992-02-04 US disclosed
US-5039775-A Process for producing polyurea resin IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 1991-08-13 US disclosed