SCHEMBL652699

SCHEMBL652699

C=C(CC(C)N(C)C)C(N)=O

nearest known ligand 0.42

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 10/20 0.42
CHRNA4 P43681 10/20 0.42
CHRNB4 P30926 8/20 0.42
CHRNA3 P32297 6/20 0.42
TDP1 Q9NUW8 2/20 0.35
GRIK1 P39086 1/20 0.30
GRIK2 Q13002 1/20 0.30
GRM1 Q13255 1/20 0.30
GRM2 Q14416 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4383958 0.80 TET2 (0.46) CHRNB2CHRNA4CHRNB4CHRNA3GRIK1
SCHEMBL15511717 0.79 TDP1 (0.32) TDP1
Hydrochloric Acid SCHEMBL28385647 0.78 TET2 (0.45) CHRNB2CHRNA4CHRNB4CHRNA3GRIK1
SCHEMBL2332604 0.77
SCHEMBL913310 0.77
SCHEMBL9809528 0.75 TDP1 (0.39) TDP1
SCHEMBL4725299 0.75
SCHEMBL444938 0.75
SCHEMBL17183757 0.73 TDP1 (0.38) TDP1GRIK1GRIK2GRM1GRM2
SCHEMBL3230407 0.71 TDP1 (0.36) TDP1GRIK1GRIK2GRM1GRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117460712-A Process for obtaining substituted alkyl (meth) acrylamides of biological origin 爱森集团 2024-01-26 CN disclosed
CN-111479882-B Antifouling composition 佐敦有限公司 2022-04-19 CN disclosed
US-20200171214-A1 BIORESORBABLE SURFACE COATING FOR DELAYING DEGRADATION DREI LILIEN PVG GMBH & CO. KG (DE) 2020-06-04 US disclosed
US-10301434-B2 Block copolymers having a polydimethylsiloxane block BASF SE (DE) 2019-05-28 US disclosed
EP-2945976-B1 BLOCK COPOLYMERS HAVING A POLYDIMETHYLSILOXANE BLOCK BASF SE (DE) 2016-12-21 EP disclosed
US-20150337086-A1 BLOCK COPOLYMERS HAVING A POLYDIMETHYLSILOXANE BLOCK BASF SE (DE) 2015-11-26 US disclosed
US-20150174292-A1 Thermoresponsive Compositions for Dermatological Use and Methods Thereof ALLERGAN, INC. (US) 2015-06-25 US disclosed
US-20140314705-A1 THERMORESPONSIVE COMPOSITIONS FOR DERMATOLOGICAL USE AND METHODS THEREOF ALLERGAN INC (US) 2014-10-23 US disclosed
EP-2768545-A2 THERMORESPONSIVE COMPOSITIONS FOR DERMATOLOGICAL USE AND METHODS THEREOF ALLERGAN, INC. (US) 2014-08-27 EP disclosed
US-20140061026-A1 Finely divided particles of core-shell structure KARLSRUHER INSTITUT FUER TECHNOLOGIE (KIT) (DE) 2014-03-06 US disclosed
CN-1974636-B Chemical mechanical polishing method and pulp, and method of manufacturing semiconductor device JSR CO., LTD. (JP) 2012-02-01 CN disclosed
US-20090239373-A1 CHEMICAL MECHANICAL POLISHING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2009-09-24 US disclosed
US-20070128874-A1 CHEMICAL MECHANICAL POLISHING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2007-06-07 US disclosed
CN-1974636-A Chemical mechanical polishing method and pulp, and method of manufacturing semiconductor device JSR CORP (JP) 2007-06-06 CN disclosed
US-7036924-B2 Protective layer-transferring film for ink jet recorded matter SEIKO EPSON CORPORATION (JP) 2006-05-02 US disclosed
US-20040027436-A1 Protective layer-transferring film for ink jet recorded matter SEIKO EPSON CORPORATION 2004-02-12 US disclosed
EP-0891993-B1 Unsaturated copolymers, processes for preparing the same, and compositions containing the same MITSUI CHEMICALS INC (JP) 2003-05-02 EP disclosed
US-6310164-B1 CONJUGATED DIENE-ALPHA-OLEFIN COPOLYMER FOR WEATHERPROOF POLYMERS MITSU CHEMICALS INC (JP) 2001-10-30 US disclosed
EP-0893245-A1 VULCANIZED MOLDING HAVING SURFACE DECORATIVE LAYER, PAINTED THERMOPLASTIC RESIN COMPOSITION, AND PAINTED ELASTOMER COMPOSITION Mitsui Chemicals, Inc. (JP) 1999-01-27 EP disclosed
EP-0891993-A1 Unsaturated copolymers, processes for preparing the same, and compositions containing the same Mitsui Chemicals, Inc. (JP) 1999-01-20 EP disclosed