Isopropyl Alcohol

Isopropyl Alcohol

SCHEMBL6535848

CC(C)O.O=C(O)CC1CCCO1

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.46
HPGD P15428 5/20 0.43
KMT2A Q03164 3/20 0.41
KDM4E B2RXH2 3/20 0.41
TDP1 Q9NUW8 2/20 0.41
LMNA P02545 3/20 0.41
POLB P06746 1/20 0.41
USP2 O75604 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
NPSR1 Q6W5P4 1/20 0.40
TP53 P04637 1/20 0.40
ALOX12 P18054 1/20 0.40
MEN1 O00255 2/20 0.40
ANPEP P15144 1/20 0.40
CYP3A4 P08684 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
PKM P14618 1/20 0.39
CYP2C19 P33261 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1698570 0.90
SCHEMBL1698442 0.90
SCHEMBL321670 0.90
Methyl Alcohol SCHEMBL28090165 0.89 ALDH1A1 (0.49) ALDH1A1HPGDKMT2AKDM4ELMNA
Hydrochloric Acid SCHEMBL3538913 0.88 ALDH1A1 (0.51) ALDH1A1HPGDKMT2AKDM4ELMNA
Water SCHEMBL28237304 0.88 ALDH1A1 (0.51) ALDH1A1HPGDKMT2AKDM4ELMNA
Chloroform SCHEMBL8919523 0.87 ALDH1A1 (0.45) ALDH1A1HPGDKMT2AKDM4ETDP1
Alcohol SCHEMBL5062091 0.87 ALDH1A1 (0.47) ALDH1A1HPGDKMT2AKDM4ELMNA
Chloroform SCHEMBL963008 0.87 ALDH1A1 (0.47) ALDH1A1HPGDKMT2AKDM4ELMNA
Isopropyl Alcohol SCHEMBL6536030 0.87 ALDH1A1 (0.40) ALDH1A1HPGDKMT2AKDM4ETDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6110529-A USING A METALORGANIC REAGENT SOLUTION CONSISTING A METALORGANIC COMPLEX DISSOLVED IN A SOLVENT OR SUSPENDING AGENT TO DEPOSIT A METAL, A METAL OXIDE OR A METAL SULFIDE ATMI, INC. 2000-08-29 US claimed
EP-1313744-A4 SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION ADVANCED TECH MATERIALS (US) 2004-03-31 EP disclosed
EP-1313744-A1 SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2003-05-28 EP disclosed
WO-2002018394-A1 SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2002-03-07 WO disclosed
US-6110529-A USING A METALORGANIC REAGENT SOLUTION CONSISTING A METALORGANIC COMPLEX DISSOLVED IN A SOLVENT OR SUSPENDING AGENT TO DEPOSIT A METAL, A METAL OXIDE OR A METAL SULFIDE ATMI, INC. 2000-08-29 US disclosed
US-5840897-A Metal complex source reagents for chemical vapor deposition ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1998-11-24 US disclosed