Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 5/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | ANPEP | P15144 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Isopropyl Alcohol SCHEMBL6535848 | 0.87 | ALDH1A1 (0.46) | ALDH1A1KDM4ETDP1HPGDKMT2A | |
| SCHEMBL321670 | 0.78 | — | — | |
| SCHEMBL1698442 | 0.78 | — | — | |
| SCHEMBL1698570 | 0.78 | — | — | |
| Methyl Alcohol SCHEMBL28090165 | 0.77 | ALDH1A1 (0.49) | ALDH1A1HTTKDM4EHPGDKMT2A | |
| Hydrochloric Acid SCHEMBL3538913 | 0.77 | ALDH1A1 (0.51) | ALDH1A1HTTKDM4EHPGDKMT2A | |
| Water SCHEMBL28237304 | 0.77 | ALDH1A1 (0.51) | ALDH1A1HTTKDM4EHPGDKMT2A | |
| Chloroform SCHEMBL8919523 | 0.76 | ALDH1A1 (0.45) | ALDH1A1KDM4ETDP1HPGDKMT2A | |
| Alcohol SCHEMBL5062091 | 0.75 | ALDH1A1 (0.47) | ALDH1A1HTTKDM4EHPGDKMT2A | |
| Chloroform SCHEMBL963008 | 0.75 | ALDH1A1 (0.47) | ALDH1A1HTTKDM4EHPGDKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1313744-A4 | SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION | ADVANCED TECH MATERIALS (US) | 2004-03-31 | — | — | EP | disclosed |
| EP-1313744-A1 | SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-05-28 | — | — | EP | disclosed |
| WO-2002018394-A1 | SOURCE REAGENT COMPOSITIONS AND METHOD FOR FORMING METAL FILMS ON A SUBSTRATE BY CHEMICAL VAPOR DEPOSITION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2002-03-07 | — | — | WO | disclosed |
| US-6126996-A | Metal complex source reagents for chemical vapor deposition | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2000-10-03 | — | — | US | disclosed |
| EP-0873343-A4 | METAL COMPLEX SOURCE REAGENTS FOR CHEMICAL VAPOR DEPOSITION | ADVANCED TECH MATERIALS (US) | 1999-12-15 | — | — | EP | disclosed |
| EP-0873343-A1 | METAL COMPLEX SOURCE REAGENTS FOR CHEMICAL VAPOR DEPOSITION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 1998-10-28 | — | — | EP | disclosed |
| WO-1996040690-A1 | METAL COMPLEX SOURCE REAGENTS FOR CHEMICAL VAPOR DEPOSITION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 1996-12-19 | — | — | WO | disclosed |