Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.47 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 4/20 | 0.47 |
| ▸ | THRA | P10827 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 4/20 | 0.36 |
| ▸ | CA1 | P00915 | 3/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | FAAH | O00519 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.36 |
| ▸ | BACE1 | P56817 | 1/20 | 0.36 |
| ▸ | CTSK | P43235 | 3/20 | 0.36 |
| ▸ | TGM2 | P21980 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.35 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13879266 | 0.94 | ZDHHC20 (0.50) | ZDHHC20ZDHHC2TSHRTHRATHRB | |
| SCHEMBL399092 | 0.88 | TSHR (0.50) | ZDHHC20ZDHHC2TSHRTHRATHRB | |
| SCHEMBL4026662 | 0.82 | ZDHHC20 (0.48) | ZDHHC20ZDHHC2TSHRTHRATHRB | |
| SCHEMBL27456857 | 0.82 | ZDHHC20 (0.48) | ZDHHC20ZDHHC2TSHRTHRATHRB | |
| SCHEMBL8196999 | 0.81 | TSHR (0.52) | ZDHHC20ZDHHC2TSHRTHRATHRB | |
| SCHEMBL108995 | 0.79 | — | — | |
| SCHEMBL1065203 | 0.79 | TSHR (0.54) | ZDHHC20ZDHHC2TSHRTHRATHRB | |
| SCHEMBL1079331 | 0.79 | ZDHHC20 (0.50) | ZDHHC20ZDHHC2TSHRTHRATHRB | |
| SCHEMBL9819625 | 0.79 | ZDHHC20 (0.46) | ZDHHC20ZDHHC2TSHRTHRATHRB | |
| SCHEMBL10877800 | 0.79 | TAS1R3 (0.51) | ZDHHC20ZDHHC2TSHRTHRATHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1169357-A4 | HYDROXY-EPOXIDE THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPEC CHEM INC (US) | 2004-03-17 | — | — | EP | claimed |
| US-6492092-B1 | SUCH AS ISOBORNYLMETHACRYLATE-P-HYDROXYPHENYLMETHACRYLAMIDE COPOLYMER WITH 1,4-CYCLOHEXANEDIMETHANOL DIGLYCIDYL ETHER CROSSLINKER; INSOLUBLE TO TOPCOAT RESIST SOLVENTS, MINIMIZES REFLECTIVITY, ETCH RATE COMPARABLE TO NOVOLAKS | ARCH SPECIALTY CHEMICALS, INC. | 2002-12-10 | — | — | US | claimed |
| JP-2002539282-A | — | — | 2002-11-19 | — | — | JP | claimed |
| EP-1169357-A1 | HYDROXY-EPOXIDE THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | Arch Specialty Chemicals, Inc. (US) | 2002-01-09 | — | — | EP | claimed |
| WO-2000053645-A1 | HYDROXY-EPOXIDE THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-09-14 | — | — | WO | claimed |
| EP-3261155-B1 | CONDUCTIVE PASTE AND MIXTURE PASTE FOR LITHIUM ION BATTERY POSITIVE ELECTRODE | KANSAI PAINT CO LTD (JP) | 2023-11-01 | — | — | EP | disclosed |
| US-10468683-B2 | Conductive paste and mixture paste for lithium ion battery positive electrode | KANSAI PAINT CO., LTD. (JP) | 2019-11-05 | — | — | US | disclosed |
| US-20170373319-A1 | CONDUCTIVE PASTE AND MIXTURE PASTE FOR LITHIUM ION BATTERY POSITIVE ELECTRODE | KANSAI PAINT CO., LTD. (JP) | 2017-12-28 | — | — | US | disclosed |
| EP-3261155-A1 | CONDUCTIVE PASTE AND MIXTURE PASTE FOR LITHIUM ION BATTERY POSITIVE ELECTRODE | Kansai Paint Co., Ltd (JP) | 2017-12-27 | — | — | EP | disclosed |
| EP-1674067-B1 | Hydrolysis-stable self-etching one-component dental adhesive | IVOCLAR VIVADENT AG (LI) | 2009-04-15 | — | — | EP | disclosed |
| EP-1169357-A4 | HYDROXY-EPOXIDE THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPEC CHEM INC (US) | 2004-03-17 | — | — | EP | disclosed |
| US-6492092-B1 | SUCH AS ISOBORNYLMETHACRYLATE-P-HYDROXYPHENYLMETHACRYLAMIDE COPOLYMER WITH 1,4-CYCLOHEXANEDIMETHANOL DIGLYCIDYL ETHER CROSSLINKER; INSOLUBLE TO TOPCOAT RESIST SOLVENTS, MINIMIZES REFLECTIVITY, ETCH RATE COMPARABLE TO NOVOLAKS | ARCH SPECIALTY CHEMICALS, INC. | 2002-12-10 | — | — | US | disclosed |
| US-5498506-A | Positive-acting radiation-sensitive mixture and recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-03-12 | — | — | US | disclosed |
| EP-0650608-A1 | POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-05-03 | — | — | EP | disclosed |
| WO-1994001805-A1 | POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-01-20 | — | — | WO | disclosed |
| EP-0033081-B1 | ANIONIC COPOLYMERS CONTAINING POLYVALENT METAL CATIONS AND THEIR USE IN PHOTOGRAPHIC MATERIALS | Agfa-Gevaert AG (DE) | 1985-04-24 | — | — | EP | disclosed |
| EP-0048412-B1 | PHOTOGRAPHIC MATERIAL WITH A TEMPORARY BARRIER LAYER | Agfa-Gevaert AG (DE) | 1984-06-20 | — | — | EP | disclosed |
| EP-0048412-A1 | Photographic material with a temporary barrier layer | Agfa-Gevaert AG (DE) | 1982-03-31 | — | — | EP | disclosed |
| EP-0033081-A1 | Anionic copolymers containing polyvalent metal cations and their use in photographic materials | Agfa-Gevaert AG (DE) | 1981-08-05 | — | — | EP | disclosed |
| US-4178182-A | ACRYLIC ESTER OF POLYOL USED AS POLYMERIZED INTERLAYER OR OVERCOAT, STORAGE STABILITY | FUJI PHOTO FILM CO., LTD (JP) | 1979-12-11 | — | — | US | disclosed |