SCHEMBL6536353

SCHEMBL6536353

CCOC(=O)c1ccc(-n2ccnc2-n2ccnc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 3/20 0.52
TBXAS1 P24557 2/20 0.51
ALDH1A1 P00352 4/20 0.47
MAPT P10636 3/20 0.47
KDM4E B2RXH2 2/20 0.47
MEN1 O00255 1/20 0.47
MITF O75030 1/20 0.47
KMT2A Q03164 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
LMNA P02545 1/20 0.46
HPGD P15428 2/20 0.46
CYP3A4 P08684 1/20 0.46
BAZ2B Q9UIF8 1/20 0.46
TP53 P04637 1/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
HSP90AA1 P07900 1/20 0.44
CACNA1B Q00975 1/20 0.44
APBA1 Q02410 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
TDP1 Q9NUW8 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6536350 0.86 HTT (0.71) HTTALDH1A1MAPTKMT2ASMN1; SMN2
SCHEMBL5800533 0.85 HTT (0.71) HTTTBXAS1ALDH1A1MAPTKDM4E
Hydrochloric Acid SCHEMBL28276875 0.83 HTT (0.69) HTTTBXAS1ALDH1A1MAPTKDM4E
SCHEMBL6536368 0.80 HTT (0.48) HTTTBXAS1ALDH1A1MAPTMEN1
SCHEMBL7657392 0.79 HPGD (0.55) HTTTBXAS1ALDH1A1MAPTSMN1; SMN2
SCHEMBL5508862 0.78 TDP1 (0.44) HTTALDH1A1MAPTMEN1KMT2A
SCHEMBL4911316 0.77 HTT (0.64) HTTALDH1A1MAPTKDM4EMEN1
SCHEMBL7487952 0.73 PDE4A (0.48) HTTTBXAS1ALDH1A1MAPTMEN1
SCHEMBL4081415 0.73 L3MBTL1 (0.58) HTTALDH1A1MAPTKDM4EMEN1
SCHEMBL9363673 0.71 HTT (0.61) HTTALDH1A1MAPTKDM4EMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117647913-A Negative photosensitive resin composition, application thereof, hardening film, preparation thereof and electronic device 深圳市道尔顿电子材料股份有限公司 2024-03-05 CN claimed
CN-118339509-A Liquid crystal aligning agent and liquid crystal display element 日产化学株式会社 2024-07-12 CN disclosed
CN-112912411-B Photocurable composition, cured film, and laminate 捷恩智株式会社 2024-07-09 CN disclosed
CN-118302462-A Polymer composition and single layer phase difference material 日产化学株式会社 2024-07-05 CN disclosed
CN-118290880-A Polymer composition and single layer phase difference material 日产化学株式会社 2024-07-05 CN disclosed
CN-118276408-A Photosensitive resin composition, photo-cured pattern formed thereby, and display device including photo-cured pattern 东友精细化工有限公司 2024-07-02 CN disclosed
CN-118043732-A Weak anchoring liquid crystal aligning agent, liquid crystal display element and polymer 日产化学株式会社 2024-05-14 CN disclosed
CN-113467183-B Resin composition for forming insulating film, insulating film produced using the same, image display device, and method for producing insulating film 东友精细化工有限公司 2024-04-23 CN disclosed
CN-111512221-B Method for manufacturing zero-face anchor film and liquid crystal display element 日产化学株式会社 2024-04-09 CN disclosed
CN-113795375-B Laminated Film 三菱化学株式会社 2024-04-09 CN disclosed
CN-105143977-B Method for producing substrate having concave pattern, composition, method for forming conductive film, electronic circuit, and electronic device JSR株式会社 2020-01-07 CN disclosed
CN-110621711-A Photocurable composition containing fluorine-based polymer 捷恩智株式会社 2019-12-27 CN disclosed
CN-110582546-A Photocurable ink for inkjet 捷恩智株式会社 2019-12-17 CN disclosed
CN-105745576-B Active energy ray-curable resin composition and spacer for display element and/or color filter protective film using same 日本化药株式会社 2019-12-17 CN disclosed
WO-2019198559-A1 PROTECTIVE FILM AND METHOD FOR PRODUCING SAME JNC株式会社 2019-10-17 WO disclosed
WO-2019194107-A1 RESIN COMPOSITION JNC株式会社 2019-10-10 WO disclosed
CN-105717746-A Photosensitive polysiloxane composition, protective film and element with protective film 奇美实业股份有限公司 2016-06-29 CN disclosed
US-6713523-B2 DECOLORING DYES FUJI PHOTO FILM CO., LTD. (JP) 2004-03-30 US disclosed
US-20020168494-A1 Photopolymerizable composition and photosensitive thermal recording material FUJI PHOTO FILM CO., LTD. 2002-11-14 US disclosed
US-20020119263-A1 Radiation sensitive composition for color filters, production process therefor, color filter and color liquid crystal display element JSR CORPORATION (JP) 2002-08-29 US disclosed