SCHEMBL6536459

SCHEMBL6536459

O=S(=O)(O)c1cc(CC(F)(F)F)cc(CC(F)(F)F)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.38
FYN P06241 1/20 0.38
ING2 Q9H160 1/20 0.36
ALDH1A1 P00352 4/20 0.35
TSHR P16473 3/20 0.35
NT5E P21589 3/20 0.35
HSD17B10 Q99714 3/20 0.35
TDP1 Q9NUW8 1/20 0.35
MRGPRX4 Q96LA9 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.33
CASP6 P55212 3/20 0.33
NSD2 O96028 2/20 0.33
DUSP3 P51452 1/20 0.33
PTPN5 P54829 1/20 0.33
PTPN11 Q06124 1/20 0.33
LMNA P02545 1/20 0.32
NAMPT P43490 1/20 0.32
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
CYP19A1 P11511 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28623274 0.81 MRGPRX4 (0.35) LCKFYNING2ALDH1A1TSHR
SCHEMBL776653 0.79 TSHR (0.50) ALDH1A1TSHRNT5EHSD17B10TDP1
SCHEMBL6536742 0.76 FABP3 (0.32)
SCHEMBL13817650 0.76 LCK (0.41) LCKFYNING2ALDH1A1TSHR
SCHEMBL3915839 0.73 LCK (0.43) LCKFYNING2ALDH1A1TSHR
SCHEMBL11460419 0.71 NT5E (0.42) LCKFYNING2ALDH1A1TSHR
SCHEMBL11107412 0.71 LCK (0.41) LCKFYNING2ALDH1A1TSHR
SCHEMBL212996 0.71 LCK (0.41) LCKFYNING2ALDH1A1TSHR
SCHEMBL26620837 0.70 ACHE (0.42) ALDH1A1
SCHEMBL11058241 0.70 NT5E (0.41) LCKFYNING2ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6756179-B2 A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP FUJI PHOTO FILM CO., LTD. (JP) 2004-06-29 US disclosed
US-20020058200-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2002-05-16 US disclosed