SCHEMBL6536742

SCHEMBL6536742

O=S(=O)(O)c1c(CC(F)(F)F)cc(CC(F)(F)F)cc1CC(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
FABP3 P05413 1/20 0.32
FABP4 P15090 1/20 0.32
FABP5 Q01469 1/20 0.32
EPHX2 P34913 1/20 0.30
NR1H4 Q96RI1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6536459 0.76 LCK (0.38)
SCHEMBL776653 0.68 TSHR (0.50)
SCHEMBL6297801 0.68 GABRA1 (0.34)
SCHEMBL28606587 0.67 ACP1 (0.32)
SCHEMBL2758459 0.67 FABP3 (0.41) FABP3FABP4FABP5
SCHEMBL28507973 0.65 FABP3 (0.39) FABP3FABP4FABP5
SCHEMBL28510186 0.65 FABP3 (0.39) FABP3FABP4FABP5
SCHEMBL28499823 0.65 FABP3 (0.39) FABP3FABP4FABP5
SCHEMBL778277 0.65 MYC (0.41) FABP4EPHX2
SCHEMBL625779 0.65 ALDH1A1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6756179-B2 A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP FUJI PHOTO FILM CO., LTD. (JP) 2004-06-29 US disclosed
US-20020058200-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2002-05-16 US disclosed