SCHEMBL6536729

SCHEMBL6536729

O=C(c1ccccc1S(=O)(=O)O)C(F)(F)F

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 1/20 0.45
MAPK1 P28482 1/20 0.42
HTT P42858 1/20 0.40
MEN1 O00255 1/20 0.39
ALDH1A1 P00352 1/20 0.39
KMT2A Q03164 1/20 0.39
PLA2G2D Q9UNK4 1/20 0.38
CA1 P00915 3/20 0.38
CA2 P00918 3/20 0.38
MMP1 P03956 1/20 0.38
MMP2 P08253 1/20 0.38
MMP9 P14780 1/20 0.38
MMP8 P22894 1/20 0.38
MMP13 P45452 1/20 0.38
KAT6A Q92794 2/20 0.37
CA9 Q16790 2/20 0.37
MYC P01106 1/20 0.37
KDM4E B2RXH2 1/20 0.36
DDX3X O00571 1/20 0.36
TSHR P16473 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18584927 0.79 ALDH1A1 (0.44) CES1MAPK1HTTALDH1A1KAT6A
Trifluoroacetic Acid SCHEMBL8735009 0.79 PRSS1 (0.41) MEN1ALDH1A1KMT2ACA1CA2
SCHEMBL1161086 0.77 CA1 (0.44) ALDH1A1KMT2ACA1CA2MMP1
SCHEMBL118459 0.75 CA1 (0.62) ALDH1A1CA1CA2MMP1MMP2
SCHEMBL1374603 0.75 CA1 (0.42) ALDH1A1CA1CA2MMP1MMP2
SCHEMBL722597 0.74 BCAT2 (0.44) ALDH1A1KMT2ACA1CA2MMP1
SCHEMBL5016602 0.74 CA1 (0.60) ALDH1A1CA1CA2MMP1MMP2
SCHEMBL1498169 0.74 KDM4E (0.50) ALDH1A1CA1CA2MMP1MMP2
Water SCHEMBL9116894 0.74 CA1 (0.60) ALDH1A1CA1CA2MMP1MMP2
SCHEMBL2524037 0.74 CA1 (0.60) ALDH1A1CA1CA2MMP1MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6756179-B2 A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP FUJI PHOTO FILM CO., LTD. (JP) 2004-06-29 US disclosed
US-20020058200-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2002-05-16 US disclosed