Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.52 |
| ▸ | MAPT | P10636 | 8/20 | 0.52 |
| ▸ | MEN1 | O00255 | 8/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.52 |
| ▸ | LMNA | P02545 | 7/20 | 0.52 |
| ▸ | NPSR1 | Q6W5P4 | 6/20 | 0.52 |
| ▸ | HPGD | P15428 | 6/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.52 |
| ▸ | ALOX12 | P18054 | 4/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.52 |
| ▸ | HTT | P42858 | 3/20 | 0.52 |
| ▸ | PKM | P14618 | 3/20 | 0.52 |
| ▸ | STAT3 | P40763 | 1/20 | 0.52 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.52 |
| ▸ | FGFR1 | P11362 | 2/20 | 0.51 |
| ▸ | FGFR3 | P22607 | 2/20 | 0.51 |
| ▸ | FGFR2 | P21802 | 1/20 | 0.51 |
| ▸ | FGFR4 | P22455 | 1/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27884550 | 0.73 | MAPT (0.48) | TSHRALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL9904910 | 0.73 | MAPT (0.87) | TSHRALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL29617021 | 0.73 | TSHR (0.80) | TSHRALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL3683272 | 0.73 | TSHR (0.80) | TSHRALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL9793702 | 0.72 | MAPT (0.61) | TSHRALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL14000090 | 0.71 | TSHR (0.49) | TSHRALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL10370782 | 0.71 | MAPT (0.67) | TSHRALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL10751474 | 0.71 | MAPT (0.64) | TSHRALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL22730641 | 0.70 | CA12 (0.63) | TSHRALDH1A1MAPTMEN1KMT2A | |
| Diethyl Phthalate SCHEMBL22296 | 0.70 | TSHR (1.00) | TSHRALDH1A1MAPTMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0820840-B1 | Method for manufacturing sensitized printing plate | FUJI PHOTO FILM CO LTD (JP) | 2004-05-26 | — | — | EP | disclosed |
| US-6672193-B2 | CONTROLLED CUTTING | FUJI PHOTO FILM CO., LTD. (JP) | 2004-01-06 | — | — | US | disclosed |
| US-20010036595-A1 | Method and apparatus for manufacturing sensitized printing plate | FUJI PHOTO FILM CO., LTD. | 2001-11-01 | — | — | US | disclosed |
| US-6258410-B1 | METALLIC SUBSTRATE WITH HYDROPHILIC SURFACE; CUTTING; PREVENTION STRESSES | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-10 | — | — | US | disclosed |
| EP-0820840-A2 | Method and apparatus for manufacturing sensitized printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |
| EP-0652489-B1 | Process for processing a photosensitive lithographic printing plate requiring no fountain solution | FUJI PHOTO FILM CO LTD (JP) | 1997-11-05 | — | — | EP | disclosed |
| US-5629136-A | POLYSILOXANES | FUJI PHOTO FILM CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| US-5580704-A | CONTAINING BASIC DYE, ORGANIC SOLVENT HAVING LOW WATER SOLUBILITY, HYDROTROPE AGENT, ANIONIC SURFACTANT; HIGH DYE DENSITY, LOW FOAMABILITY, NONPRECIPITATING, NONSTAINING | FUJI PHOTO FILM CO., LTD. (JP) | 1996-12-03 | — | — | US | disclosed |
| US-5503074-A | ALUMINUM BASE WITH SPECIFIED ROUGHNESS AND WHITENESS HAVING FORMED THEREON HOMOGENEOUS PRIMER LAYER COMPRISING BINDER, PHOTOSENSITIVE LAYER, SILICONE RUBBER LAYER | FUJI PHOTO FILM CO., LTD. (JP) | 1996-04-02 | — | — | US | disclosed |
| EP-0652489-A1 | Process for processing a photosensitive lithographic printing plate requiring no fountain solution | FUJI PHOTO FILM CO., LTD. (JP) | 1995-05-10 | — | — | EP | disclosed |
| EP-0118766-B1 | LIGHT-SENSITIVE COMPOSITION | KONICA CORPORATION (JP) | 1989-01-04 | — | — | EP | disclosed |
| EP-0097503-B1 | PROCESS FOR PREPARING A LITHOGRAPHIC PRINTING PLATE | KONICA CORPORATION (JP) | 1988-08-17 | — | — | EP | disclosed |
| US-4504567-A | Light-sensitive lithographic printing plate | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1985-03-12 | — | — | US | disclosed |
| US-4492740-A | CHROMIUM OXIDE ON IRON | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1985-01-08 | — | — | US | disclosed |
| EP-0118766-A2 | Light-sensitive composition | KONICA CORPORATION (JP) | 1984-09-19 | — | — | EP | disclosed |
| EP-0098166-A2 | Support for lithographic printing plate | KONICA CORPORATION (JP) | 1984-01-11 | — | — | EP | disclosed |
| EP-0097503-A2 | Process for preparing a lithographic printing plate | KONICA CORPORATION (JP) | 1984-01-04 | — | — | EP | disclosed |
| EP-0009223-B1 | PHOTOSENSITIVE COMPOSITION | MITSUBISHI KASEI CORPORATION (JP) | 1982-11-10 | — | — | EP | disclosed |
| US-4258124-A | Photosensitive composition | MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) | 1981-03-24 | — | — | US | disclosed |
| EP-0009223-A2 | Photosensitive composition | MITSUBISHI KASEI CORPORATION (JP) | 1980-04-02 | — | — | EP | disclosed |