SCHEMBL6537288

SCHEMBL6537288

C1=CC2CCC1C2.CCOC(=O)C(=O)OC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.41
MAPT P10636 2/20 0.36
RAB9A P51151 3/20 0.36
MGAM O43451 1/20 0.34
SI P14410 1/20 0.34
MGAM2 Q2M2H8 1/20 0.34
EGLN1 Q9GZT9 1/20 0.34
ALDH1A1 P00352 5/20 0.34
NFKB1 P19838 1/20 0.34
NFKB2 Q00653 1/20 0.34
RELA Q04206 1/20 0.34
TRPM8 Q7Z2W7 1/20 0.33
RECQL P46063 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C19 P33261 1/20 0.33
TP53 P04637 1/20 0.33
ALOX15 P16050 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
NPC1 O15118 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27564301 0.84 ALDH1A1 (0.43) GAARAB9AMGAMSIMGAM2
SCHEMBL6936304 0.79 PPM1B (0.36) GAAMGAMSIMGAM2ALDH1A1
SCHEMBL129683 0.78
Urethane SCHEMBL29060490 0.78 ALOX15 (0.58) GAAMGAMSIMGAM2ALDH1A1
SCHEMBL28711374 0.76 GAA (0.50) GAAMAPTMGAMSIMGAM2
SCHEMBL28265819 0.76
SCHEMBL28282225 0.76 GAA (0.50) GAAMAPTMGAMSIMGAM2
Ammonia Solution, Strong SCHEMBL27348838 0.76 GAA (0.50) GAAMAPTMGAMSIMGAM2
SCHEMBL4146062 0.74 POLB (0.33) MAPTALDH1A1CYP1A2CYP3A4CYP2C19
Acetic Acid Methyl Ester SCHEMBL3268142 0.74 ALDH1A1 (0.48) MAPTALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6794459-B2 PHOTOLITHOGRAPHY SUMITOMO BAKELITE CO., LTD. (JP) 2004-09-21 US disclosed
US-6723486-B2 POLYMERIZING AT LEAST TWO TYPES OF POLYCYCLIC (NORBORNENE) MONOMERS ONE OF WHICH CONTAINING A PENDANT ACID LABILE GROUP AND ANOTHER OF WHICH CONTAINING A PENDNT POLAR FUNCTIONAL GROUP USING A GROUP 8 TRANSITION METAL CATALYST SUMITOMO BAKELITE CO., LTD. (JP) 2004-04-20 US disclosed
EP-1060206-B1 MODIFIED POLYCYCLIC POLYMERS SUMITOMO BAKELITE CO (JP) 2004-04-14 EP disclosed
US-20030018153-A1 Modified polycyclic polymers THE B.F.GOODRICH COMPANY 2003-01-23 US disclosed
US-6451945-B1 CONTAINING PENDANT ACID LABILE FUNCTIONAL GROUP AND A FUNCTIONAL GROUP CONTAINING A METHYL CARBONYL OR SILYL PROTECTED HYDROXYL MOIETY THE B.F. GOODRICH COMPANY 2002-09-17 US disclosed
US-20020128408-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-12 US disclosed
US-6232417-B1 USING COORDINATION CATALYST THE B. F. GOODRICH COMPANY 2001-05-15 US disclosed
EP-1060206-A1 MODIFIED POLYCYCLIC POLYMERS The B.F.Goodrich Co. (US) 2000-12-20 EP disclosed
EP-1021750-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
EP-1021477-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
WO-1999042510-A1 MODIFIED POLYCYCLIC POLYMERS THE B.F. GOODRICH COMPANY (US) 1999-08-26 WO disclosed
WO-1999014635-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed
WO-1999014256-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed