SCHEMBL6537290

SCHEMBL6537290

COCC(=O)OCC1CC2C=CC1C2

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 9/20 0.39
POLB P06746 2/20 0.39
ALOX15 P16050 1/20 0.39
ALDH1A1 P00352 6/20 0.36
HPGD P15428 1/20 0.35
PKM P14618 2/20 0.35
MAPT P10636 1/20 0.35
MAPK1 P28482 1/20 0.35
EPHX2 P34913 2/20 0.35
KMT2A Q03164 2/20 0.34
TDP1 Q9NUW8 2/20 0.34
LMNA P02545 1/20 0.33
RAB9A P51151 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL457240 0.84 KDM4E (0.41) KDM4EPOLBALOX15ALDH1A1PKM
SCHEMBL414809 0.83 EPHX2 (0.41) KDM4EPOLBALOX15ALDH1A1PKM
Acetic Acid SCHEMBL28542499 0.81 KDM4E (0.40) KDM4EPOLBALOX15ALDH1A1PKM
SCHEMBL8751808 0.81 EPHX2 (0.38) KDM4EPOLBALOX15ALDH1A1HPGD
SCHEMBL32688531 0.81 KDM4E (0.37) KDM4EPOLBALOX15ALDH1A1PKM
SCHEMBL455925 0.81 NLRP3 (0.43) KDM4EPOLBALOX15ALDH1A1PKM
SCHEMBL8614083 0.81 EPHX2 (0.40) KDM4EPOLBALOX15ALDH1A1PKM
SCHEMBL5349663 0.81 KDM4E (0.39) KDM4EPOLBALOX15ALDH1A1HPGD
SCHEMBL1087442 0.81 EPHX2 (0.40) KDM4EPOLBALOX15ALDH1A1PKM
SCHEMBL14544703 0.80 KDM4E (0.40) KDM4EPOLBALOX15ALDH1A1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6723486-B2 POLYMERIZING AT LEAST TWO TYPES OF POLYCYCLIC (NORBORNENE) MONOMERS ONE OF WHICH CONTAINING A PENDANT ACID LABILE GROUP AND ANOTHER OF WHICH CONTAINING A PENDNT POLAR FUNCTIONAL GROUP USING A GROUP 8 TRANSITION METAL CATALYST SUMITOMO BAKELITE CO., LTD. (JP) 2004-04-20 US disclosed
US-20020128408-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-12 US disclosed
US-6232417-B1 USING COORDINATION CATALYST THE B. F. GOODRICH COMPANY 2001-05-15 US disclosed
EP-1021477-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
WO-1999014256-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed