SCHEMBL6537833

SCHEMBL6537833

FC(F)(F)c1[c]c(C(F)(F)F)cc(C(F)(F)F)c1.[LiH]

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.37
TSHR P16473 3/20 0.33
IDO1 P14902 2/20 0.33
ALDH1A1 P00352 2/20 0.33
NOS3 P29474 1/20 0.33
NOS2 P35228 1/20 0.33
CYP3A4 P08684 1/20 0.31
HPGD P15428 1/20 0.31
ALOX15 P16050 1/20 0.31
HIF1A Q16665 1/20 0.31
TXNRD1 Q16881 1/20 0.31
TXNRD3 Q86VQ6 1/20 0.31
TXNRD2 Q9NNW7 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
MAPK1 P28482 1/20 0.31
LMNA P02545 1/20 0.31
GPR35 Q9HC97 1/20 0.30
PTPN5 P54829 1/20 0.30
HTR2C P28335 1/20 0.30
ADRB1 P08588 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL97065 0.97 CES2 (0.39) CES2TSHRIDO1ALDH1A1NOS3
SCHEMBL23174645 0.94 CES2 (0.37) CES2TSHRIDO1ALDH1A1NOS3
SCHEMBL16390881 0.80 CES2 (0.37) CES2LMNAGPR35
SCHEMBL697546 0.80 CES2 (0.32) CES2
SCHEMBL697742 0.80 ALDH1A1 (0.35) CES2TSHRALDH1A1CYP3A4HPGD
SCHEMBL1841922 0.79
SCHEMBL3337947 0.75 NOTUM (0.32) IDO1GPR35
SCHEMBL16986315 0.75
SCHEMBL1842608 0.74
SCHEMBL6223113 0.73 ALDH1A1 (0.46) TSHRALDH1A1CYP3A4HPGDALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1148396-C Photoeresist composition comprising polycyclic polymers with acid labile pendant groups ס�ѵ�ľ��ʽ���� 2004-05-05 CN disclosed
US-6723486-B2 POLYMERIZING AT LEAST TWO TYPES OF POLYCYCLIC (NORBORNENE) MONOMERS ONE OF WHICH CONTAINING A PENDANT ACID LABILE GROUP AND ANOTHER OF WHICH CONTAINING A PENDNT POLAR FUNCTIONAL GROUP USING A GROUP 8 TRANSITION METAL CATALYST SUMITOMO BAKELITE CO., LTD. (JP) 2004-04-20 US disclosed
US-20020128408-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-12 US disclosed
US-6232417-B1 USING COORDINATION CATALYST THE B. F. GOODRICH COMPANY 2001-05-15 US disclosed
CN-1269810-A Photoresist compositions comprising polycyclic polymers with acid labile pendant groups GOODRICH CO B F (US) 2000-10-11 CN disclosed
EP-1021477-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 2000-07-26 EP disclosed
WO-1999014256-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1999-03-25 WO disclosed