Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 6/20 | 0.50 |
| ▸ | CDC25B | P30305 | 2/20 | 0.44 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.41 |
| ▸ | EP300 | Q09472 | 1/20 | 0.41 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.41 |
| ▸ | KAT8 | Q9H7Z6 | 1/20 | 0.41 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.41 |
| ▸ | LDHA | P00338 | 1/20 | 0.40 |
| ▸ | CTSB | P07858 | 2/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | GSK3B | P49841 | 1/20 | 0.39 |
| ▸ | CAPN1 | P07384 | 1/20 | 0.39 |
| ▸ | CTSL | P07711 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | NSD2 | O96028 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11893584 | 0.81 | PRNP (0.50) | GSK3BKDM4EMEN1KMT2AMAPT | |
| SCHEMBL8445974 | 0.79 | KDM4E (0.54) | GSK3BKDM4EMEN1KMT2AMAPT | |
| SCHEMBL678559 | 0.75 | IDO1 (0.59) | IDO1CDC25BHDAC3EP300KAT2B | |
| SCHEMBL29497936 | 0.75 | IDO1 (0.59) | IDO1CDC25BHDAC3EP300KAT2B | |
| SCHEMBL3924866 | 0.74 | IDO1 (0.56) | IDO1CDC25BHDAC3EP300KAT2B | |
| Hydrochloric Acid SCHEMBL3924869 | 0.74 | LDHA (0.57) | IDO1CDC25BHDAC3EP300KAT2B | |
| SCHEMBL31655501 | 0.74 | ATM (0.62) | IDO1CDC25BHDAC3EP300KAT2B | |
| SCHEMBL5708577 | 0.74 | ATM (0.62) | IDO1CDC25BHDAC3EP300KAT2B | |
| Water SCHEMBL29153729 | 0.74 | THRB (0.57) | IDO1CDC25BHDAC3EP300KAT2B | |
| SCHEMBL7400105 | 0.74 | MAPT (0.60) | IDO1CDC25BHDAC3EP300KAT2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-7159992-A | — | — | None | — | — | JP | disclosed |
| US-6790564-B2 | FOR USE IN PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES; EFFICIENCY | RENESAS TECHNOLOGY CORPORATION (JP) | 2004-09-14 | — | — | US | disclosed |
| EP-0911153-B1 | Image forming method | KONISHIROKU PHOTO IND (JP) | 2003-12-10 | — | — | EP | disclosed |
| US-20020086222-A1 | Photomask and manufacturing method of an electronic device therewith | RENESAS ELECTRONICS CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-6319649-B1 | CAN FORM PATTERN WITH HIGH SENSITIVITY, RESOLUTION ABILITY AND STABILITY, ACCURACY | HITACHI, LTD. (JP) | 2001-11-20 | — | — | US | disclosed |
| US-6174646-B1 | IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION | KONICA CORPORATION (JP) | 2001-01-16 | — | — | US | disclosed |
| EP-0911153-A1 | Image forming method | KONICA CORPORATION (JP) | 1999-04-28 | — | — | EP | disclosed |
| JP-H07159992-A | PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD | HITACHI LTD | 1995-06-23 | — | — | JP | disclosed |
| EP-0620500-A2 | Resist and pattern formation using the same | HITACHI, LTD. (JP) | 1994-10-19 | — | — | EP | disclosed |