SCHEMBL6543390

SCHEMBL6543390

COc1cc2ccc(C(=O)CBr)cc2cc1OC

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.62
GSK3B P49841 3/20 0.59
ALDH1A1 P00352 3/20 0.49
CYP1A2 P05177 2/20 0.49
CYP2C19 P33261 2/20 0.49
HPGD P15428 2/20 0.49
HSD17B10 Q99714 1/20 0.49
TSHR P16473 2/20 0.46
CTNNB1 P35222 2/20 0.46
WNT3A P56704 2/20 0.46
MAPT P10636 2/20 0.46
KDM4E B2RXH2 2/20 0.45
CYP3A4 P08684 1/20 0.44
CYP2C9 P11712 1/20 0.44
XDH P47989 1/20 0.44
NPC1 O15118 1/20 0.44
LMNA P02545 1/20 0.44
HTT P42858 1/20 0.44
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31065275 0.85 GSK3B (0.71) PTPN1GSK3BALDH1A1CYP1A2CYP2C19
SCHEMBL10416407 0.85 MEN1 (0.59) ALDH1A1CYP1A2CYP2C19HPGDHSD17B10
SCHEMBL571370 0.85 GSK3B (0.71) PTPN1GSK3BALDH1A1CYP1A2CYP2C19
SCHEMBL9557967 0.84 HPGD (0.51) PTPN1ALDH1A1CYP1A2CYP2C19HPGD
SCHEMBL29620831 0.84 TSHR (0.63) GSK3BALDH1A1CYP1A2CYP2C19TSHR
SCHEMBL426444 0.84 TSHR (0.63) GSK3BALDH1A1CYP1A2CYP2C19TSHR
SCHEMBL15114347 0.84 PTPN1 (0.78) PTPN1GSK3BALDH1A1CYP1A2CYP2C19
SCHEMBL11482012 0.84 PTPN1 (0.84) PTPN1GSK3BALDH1A1CYP1A2CYP2C19
SCHEMBL6337892 0.83 ALDH1A1 (0.49) GSK3BALDH1A1CYP1A2CYP2C19HPGD
SCHEMBL9558246 0.83 HPGD (0.50) PTPN1ALDH1A1CYP1A2CYP2C19HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0620500-A2 Resist and pattern formation using the same HITACHI, LTD. (JP) 1994-10-19 EP claimed
JP-7159992-A None JP disclosed
US-6790564-B2 FOR USE IN PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES; EFFICIENCY RENESAS TECHNOLOGY CORPORATION (JP) 2004-09-14 US disclosed
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-20020086222-A1 Photomask and manufacturing method of an electronic device therewith RENESAS ELECTRONICS CORPORATION (JP) 2002-07-04 US disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed
US-5618822-A N-substituted trifluoromethylphenyltetrahydropyridines, process for the preparation thereof, intermediates in said process and pharmaceutical compositions containing them SANOFI (FR) 1997-04-08 US disclosed
US-5599941-A N-substituted trifluoromethylphenyltetrahydropyridines process for the preparation thereof intermediates in said process and pharmaceutical compositions containing them SANOFI (FR) 1997-02-04 US disclosed
US-5596101-A N-substituted trifluoromethylphenyltetrahydropyridines, process for the preparation thereof, intermediates in said process and pharmaceutical compositions containing them SANOFI (FR) 1997-01-21 US disclosed
US-5559238-A N-substituted trifluoromethylphenyltetrahydropyridenes process for the preparation thereof, intermediates in said process and pharmaceutical compositions containing them SANOFI (FR) 1996-09-24 US disclosed
US-5462945-A N-substituted trifluoromethylphenyltetrahydropyridines, process for the preparation thereof, intermediates in said process and pharmaceutical compositions containing them SANOFI (FR) 1995-10-31 US disclosed
JP-H07159992-A PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD HITACHI LTD 1995-06-23 JP disclosed
EP-0620500-A2 Resist and pattern formation using the same HITACHI, LTD. (JP) 1994-10-19 EP disclosed
EP-0458697-B1 N-substituted trifluoromethylphenyl tetrahydropyridines, process for their preparation, intermediates and pharmaceutical preparations containing them SANOFI ELF (FR) 1994-07-27 EP disclosed
US-5281606-A N-substituted trifluoromethylphenyltetrahydropyridines, process for the preparation thereof, intermediates in said process and pharmaceutical compositions containing them SANOFI (FR) 1994-01-25 US disclosed
EP-0458697-A1 N-substituted trifluoromethylphenyl tetrahydropyridines, process for their preparation, intermediates and pharmaceutical preparations containing them ELF SANOFI (FR) 1991-11-27 EP disclosed
US-4327022-A Heterocyclic alkyl naphthols STERLING DRUG INC. (US) 1982-04-27 US disclosed
US-4169108-A 5(OR 6)-[(Substituted-amino)alkyl]-2,3-naphthalenediols STERLING DRUG INC. (US) 1979-09-25 US disclosed