SCHEMBL6550637

SCHEMBL6550637

CCCCCC(=O)C[S+]1CCCCC1.CCCCS(=O)(=O)[O-]

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 4/20 0.35
CES1 P23141 4/20 0.35
HAO1 Q9UJM8 1/20 0.35
EPHX2 P34913 1/20 0.35
KMT2A Q03164 3/20 0.34
TDP1 Q9NUW8 3/20 0.34
L3MBTL1 Q9Y468 2/20 0.34
MEN1 O00255 2/20 0.34
MAPT P10636 1/20 0.34
NAAA Q02083 1/20 0.31
AKR1B1 P15121 1/20 0.31
PPARG P37231 3/20 0.30
PPARD Q03181 3/20 0.30
PPARA Q07869 3/20 0.30
TSHR P16473 2/20 0.30
GPR84 Q9NQS5 2/20 0.30
HDAC11 Q96DB2 2/20 0.30
ALDH1A1 P00352 1/20 0.30
SLC22A6 Q4U2R8 1/20 0.30
SLC22A8 Q8TCC7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6550505 0.99 HAO1 (0.37) CES2CES1HAO1EPHX2KMT2A
SCHEMBL6549622 0.99 CES2 (0.36) CES2CES1HAO1EPHX2KMT2A
SCHEMBL6551036 0.97 HAO1 (0.38) CES2CES1HAO1EPHX2KMT2A
SCHEMBL6551534 0.96 CES1 (0.33) CES2CES1EPHX2
SCHEMBL6550408 0.94 CES1 (0.34) CES2CES1HAO1EPHX2MAPT
SCHEMBL6551406 0.93 EPHX2 (0.33) EPHX2
SCHEMBL6548781 0.91 EPHX2 (0.33) CES2CES1EPHX2MAPTALDH1A1
SCHEMBL6550943 0.88 EPHX2 (0.33) EPHX2MAPTALDH1A1HSD17B10
SCHEMBL6550551 0.87 EPHX2 (0.34) EPHX2MAPTALDH1A1HSD17B10
SCHEMBL6728033 0.86 KMT2A (0.44) CES2CES1HAO1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed