SCHEMBL6551406

SCHEMBL6551406

CCCC(=O)C[S+]1CCCCC1.CCCCS(=O)(=O)[O-]

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.33
BBOX1 O75936 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6548781 0.98 EPHX2 (0.33) EPHX2BBOX1
SCHEMBL6551534 0.94 CES1 (0.33) EPHX2BBOX1
SCHEMBL6550637 0.93 CES2 (0.35) EPHX2
SCHEMBL6550408 0.93 CES1 (0.34) EPHX2BBOX1
SCHEMBL6550505 0.92 HAO1 (0.37) EPHX2
SCHEMBL6549622 0.91 CES2 (0.36) EPHX2
SCHEMBL6551036 0.90 HAO1 (0.38) EPHX2
SCHEMBL6550943 0.90 EPHX2 (0.33) EPHX2BBOX1
SCHEMBL6550551 0.88 EPHX2 (0.34) EPHX2BBOX1
SCHEMBL7158447 0.86 EPHX2 (0.32) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed