Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6549188

CCCCCC(=O)C[S+](CC)CC.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.41

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Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
FAAH O00519 8/20 0.41
CES1 P23141 8/20 0.40
CES2 O00748 5/20 0.40
MEN1 O00255 1/20 0.40
CYP1A2 P05177 1/20 0.40
KMT2A Q03164 1/20 0.40
HSD17B10 Q99714 1/20 0.40
KCNH2 Q12809 6/20 0.38
HAO1 Q9UJM8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6550530 0.98 CES1 (0.42) FAAHCES1CES2MEN1CYP1A2
Trifluoromethanesulfonic Acid SCHEMBL6548887 0.95 CES1 (0.36) FAAHCES1CES2MEN1CYP1A2
Trifluoromethanesulfonic Acid SCHEMBL6549514 0.89 FAAH (0.40) FAAHCES1CES2MEN1CYP1A2
Trifluoromethanesulfonic Acid SCHEMBL6549782 0.89 CES2 (0.32) CES1CES2KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6551136 0.88 CES1 (0.41) FAAHCES1CES2MEN1CYP1A2
SCHEMBL6550698 0.86 FAAH (0.35) FAAHCES1CES2MEN1CYP1A2
Trifluoromethanesulfonic Acid SCHEMBL6551195 0.86 FAAH (0.42) FAAHCES1CES2MEN1CYP1A2
SCHEMBL6549402 0.85 FAAH (0.34) FAAHCES1CES2MEN1CYP1A2
SCHEMBL6550875 0.85 FAAH (0.36) FAAHCES1CES2MEN1CYP1A2
Trifluoromethanesulfonic Acid SCHEMBL6550755 0.84 CES1 (0.35) FAAHCES1CES2MEN1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed