Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6551195

CCCCCC(=O)C[S+](C)C.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.42

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Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
FAAH O00519 8/20 0.42
KCNH2 Q12809 6/20 0.41
CES1 P23141 8/20 0.41
CES2 O00748 5/20 0.41
MEN1 O00255 1/20 0.41
CYP1A2 P05177 1/20 0.41
KMT2A Q03164 1/20 0.41
HSD17B10 Q99714 1/20 0.41
HAO1 Q9UJM8 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6549836 0.98 KCNH2 (0.43) FAAHKCNH2CES1CES2MEN1
Trifluoromethanesulfonic Acid SCHEMBL6550731 0.95 KCNH2 (0.39) FAAHKCNH2CES1CES2MEN1
Trifluoromethanesulfonic Acid SCHEMBL6548744 0.88 KCNH2 (0.35) KCNH2CES1CES2
Trifluoromethanesulfonic Acid SCHEMBL6550483 0.86 FAAH (0.39) FAAHKCNH2CES1CES2MEN1
Trifluoromethanesulfonic Acid SCHEMBL6549188 0.86 FAAH (0.41) FAAHKCNH2CES1CES2MEN1
SCHEMBL6551516 0.86 FAAH (0.36) FAAHKCNH2CES1CES2MEN1
Trifluoromethanesulfonic Acid SCHEMBL6550918 0.85 CES1 (0.40) FAAHKCNH2CES1CES2MEN1
SCHEMBL6550899 0.84 FAAH (0.37) FAAHKCNH2CES1CES2MEN1
SCHEMBL6549763 0.84 FAAH (0.35) FAAHKCNH2CES1CES2MEN1
Trifluoromethanesulfonic Acid SCHEMBL6549514 0.84 FAAH (0.40) FAAHKCNH2CES1CES2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed