Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6549345

CCCCC(=O)C[S+](C)C(C)(C)C.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.34

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Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CES1 P23141 7/20 0.34
CES2 O00748 3/20 0.34
KCNH2 Q12809 6/20 0.34
FAAH O00519 8/20 0.33
MEN1 O00255 1/20 0.32
CYP1A2 P05177 1/20 0.32
KMT2A Q03164 1/20 0.32
HSD17B10 Q99714 1/20 0.32
CA1 P00915 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6550483 0.95 FAAH (0.39) CES1CES2KCNH2FAAHMEN1
Trifluoromethanesulfonic Acid SCHEMBL6550918 0.94 CES1 (0.40) CES1CES2KCNH2FAAHMEN1
Trifluoromethanesulfonic Acid SCHEMBL6550962 0.91 CES2 (0.30) CES1CES2KCNH2
SCHEMBL6549548 0.86 CA1 (0.31) CA1
Trifluoromethanesulfonic Acid SCHEMBL6550731 0.86 KCNH2 (0.39) CES1CES2KCNH2FAAHMEN1
SCHEMBL6551076 0.85 CA1 (0.33) CA1
SCHEMBL6726179 0.85 CES1 (0.41) CES1CES2FAAHMEN1CYP1A2
SCHEMBL6549512 0.85 CES1 (0.34) CES1CES2MEN1KMT2ACA1
Trifluoromethanesulfonic Acid SCHEMBL6550496 0.84 TDP1 (0.30)
SCHEMBL6550981 0.83 FAAH (0.33) CES1CES2FAAHMEN1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed