SCHEMBL6550976

SCHEMBL6550976

CCCCCC(=O)C[S+](C)C1CCCCC1.Cc1ccc(S(=O)(=O)[O-])cc1

nearest known ligand 0.39

Known targets — ChEMBL curated mechanism

CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ADORA3 P0DMS8 1/20 0.36
ALDH1A1 P00352 2/20 0.36
CYP2C9 P11712 2/20 0.36
TSHR P16473 2/20 0.35
LMNA P02545 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35
HTT P42858 1/20 0.35
KCNH2 Q12809 1/20 0.35
HIF1A Q16665 1/20 0.35
CYP3A4 P08684 1/20 0.35
POLB P06746 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6551324 0.99 ALDH1A1 (0.38) ADORA3ALDH1A1CYP2C9TSHRLMNA
SCHEMBL6550369 0.97 CCR1 (0.37) ADORA3ALDH1A1CYP2C9TSHRLMNA
SCHEMBL6549432 0.92 ADORA3 (0.38) ADORA3ALDH1A1CYP2C9TSHRLMNA
SCHEMBL6550691 0.87 ADORA3 (0.40) ADORA3ALDH1A1CYP2C9TSHRCYP2C19
SCHEMBL6549790 0.82 ADORA3 (0.41) ADORA3ALDH1A1CYP2C9TSHRLMNA
SCHEMBL6551412 0.82 ALDH1A1 (0.42) ALDH1A1CYP2C9TSHRLMNACYP2D6
SCHEMBL6734934 0.82 NAAA (0.45)
SCHEMBL6549426 0.81 NAAA (0.37)
SCHEMBL6551070 0.81 ALDH1A1 (0.44) ALDH1A1CYP2C9TSHRLMNACYP2D6
SCHEMBL6736720 0.80 NAAA (0.47)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed