SCHEMBL6549856

SCHEMBL6549856

CCCC(=O)C[S+](C)C1CCCCC1.CCCCS(=O)(=O)[O-]

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.32
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6549709 0.95 NAAA (0.32) NAAAEPHX2
SCHEMBL6549426 0.94 NAAA (0.37) NAAAEPHX2
SCHEMBL6550424 0.92 NAAA (0.39) NAAAEPHX2
SCHEMBL6551148 0.91 EPHX2 (0.31) NAAAEPHX2
SCHEMBL6549177 0.86 EPHX2 (0.32) NAAAEPHX2
SCHEMBL6734047 0.84 NAAA (0.34) NAAA
SCHEMBL7160025 0.84 NAAA (0.35) NAAAEPHX2
SCHEMBL7160641 0.84 NAAA (0.35) NAAAEPHX2
SCHEMBL6549413 0.83 MMP1 (0.32)
SCHEMBL7160437 0.83 ALDH1A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed