Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6548744

CCCC(=O)C[S+](C)C.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.35

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Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 7/20 0.35
CES2 O00748 1/20 0.33
CES1 P23141 1/20 0.33
FFAR3 O14843 2/20 0.31
HDAC3 O15379 2/20 0.31
HDAC1 Q13547 2/20 0.31
HDAC2 Q92769 2/20 0.31
HDAC8 Q9BY41 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6550731 0.90 KCNH2 (0.39) KCNH2CES2CES1
Trifluoromethanesulfonic Acid SCHEMBL6551195 0.88 FAAH (0.42) KCNH2CES2CES1
Trifluoromethanesulfonic Acid SCHEMBL6549836 0.87 KCNH2 (0.43) KCNH2CES2CES1
Trifluoromethanesulfonic Acid SCHEMBL2918741 0.87 KCNH2 (0.33) KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6549846 0.85 KCNH2 (0.33) KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6550962 0.85 CES2 (0.30) KCNH2CES2CES1
SCHEMBL6550832 0.84 CA1 (0.35)
Trifluoromethanesulfonic Acid SCHEMBL6549782 0.84 CES2 (0.32) KCNH2CES2CES1FFAR3HDAC3
SCHEMBL6551108 0.83 CA2 (0.37)
Trifluoromethanesulfonic Acid SCHEMBL6550633 0.81 CES2 (0.30) KCNH2CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed