Methacrylic Acid

Methacrylic Acid

SCHEMBL6553326

C=C(C)C(=O)O.CCC1=NCCO1

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL6552361 0.87
Methacrylic Acid SCHEMBL6553100 0.84 THRA (0.31)
Propionic Acid SCHEMBL15412712 0.84 FFAR3 (0.39)
Acetic Acid SCHEMBL4074356 0.82 GAA (0.33)
Methacrylic Acid SCHEMBL6552372 0.82
SCHEMBL25266 0.81
SCHEMBL6683456 0.79
SCHEMBL3919995 0.79 ADRA2A (0.32)
SCHEMBL10755796 0.78
Phosphoric Acid SCHEMBL10750839 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240053292-A1 POLYMERIC ORGANOMETALLIC REDOX MEDIATOR FOR CONTINUOUS KETONE AND GLUCOSE MONITORING Evolve Scientific Solutions LLC 2024-02-15 US disclosed
CN-105017445-B PH response star polymer and micella and composite based on beta cyclodextrin 华南理工大学 2017-06-20 CN disclosed
EP-0978391-B1 Coating agent for ink jet recording materials and ink jet recording material ESPRIT CHEMICAL CO (US) 2004-02-11 EP disclosed
US-6548182-B1 Water-soluble polymer with 30.1-95 wt% of carboxyl groups and a crosslinking agent ESPRIT CHEMICAL CO. 2003-04-15 US disclosed
EP-0978391-A1 Coating agent for ink jet recording materials and ink jet recording material Esprit Chemical Co. (US) 2000-02-09 EP disclosed