Methacrylic Acid

Methacrylic Acid

SCHEMBL6552372

C=C(C)C(=O)O.CC(C)CC1=NCCO1

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6552363 0.83
Methacrylic Acid SCHEMBL6553326 0.82
Methacrylic Acid SCHEMBL6552361 0.79
Methacrylic Acid SCHEMBL6553100 0.77 THRA (0.31)
Methacrylic Acid SCHEMBL6553304 0.76 ADRA2A (0.35)
Methacrylic Acid SCHEMBL6553622 0.73 KDM4E (0.30)
SCHEMBL25195137 0.72 NOS3 (0.40)
Methacrylic Acid SCHEMBL6553228 0.69 KCNN4 (0.39)
Methacrylic Acid SCHEMBL28174009 0.69 KDM4E (0.31)
Propionic Acid SCHEMBL15412712 0.66 FFAR3 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0978391-B1 Coating agent for ink jet recording materials and ink jet recording material ESPRIT CHEMICAL CO (US) 2004-02-11 EP disclosed
US-6548182-B1 Water-soluble polymer with 30.1-95 wt% of carboxyl groups and a crosslinking agent ESPRIT CHEMICAL CO. 2003-04-15 US disclosed
EP-0978391-A1 Coating agent for ink jet recording materials and ink jet recording material Esprit Chemical Co. (US) 2000-02-09 EP disclosed