Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.40 |
| ▸ | AKT1 | P31749 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.36 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.36 |
| ▸ | TGM2 | P21980 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.36 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.36 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.35 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.35 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.35 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.35 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4888619 | 0.87 | TSHR (0.50) | TSHRALDH1A1HTTCYP1A2AKT1 | |
| SCHEMBL1123626 | 0.82 | CES1 (0.46) | TSHRALDH1A1HTTCYP1A2AKT1 | |
| SCHEMBL13765616 | 0.79 | KCNN4 (0.56) | TSHRALDH1A1HTTKMT2AMAPT | |
| SCHEMBL13765701 | 0.79 | KCNN4 (0.56) | TSHRALDH1A1HTTKMT2AMAPT | |
| SCHEMBL29163775 | 0.75 | PIN1 (0.47) | TSHRALDH1A1KMT2AMAPTNPSR1 | |
| SCHEMBL11043920 | 0.72 | HTT (0.46) | TSHRALDH1A1HTTCYP1A2AKT1 | |
| SCHEMBL17022732 | 0.72 | MAPT (0.41) | TSHRALDH1A1HTTCYP1A2AKT1 | |
| SCHEMBL902761 | 0.72 | ALDH1A1 (0.42) | TSHRALDH1A1HTTCYP1A2AKT1 | |
| SCHEMBL4887210 | 0.72 | KDM4E (0.48) | TSHRALDH1A1HTTCYP1A2AKT1 | |
| SCHEMBL10608360 | 0.72 | ALDH1A1 (0.42) | TSHRALDH1A1HTTCYP1A2AKT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4317287-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, AND SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2024-02-07 | — | — | EP | disclosed |
| CN-116253888-A | Curable silicone composition and cured product thereof | 杜邦东丽特殊材料株式会社 | 2023-06-13 | — | — | CN | disclosed |
| EP-1220823-B1 | PROCESS FOR THE SYNTHESIS OF 2-HYDROXYPHENYL ALKYL KETONES | ENDURA SPA (IT) | 2004-02-25 | — | — | EP | disclosed |
| EP-1220823-A1 | PROCESS FOR THE SYNTHESIS OF 2-HYDROXYPHENYL ALKYL KETONES | ENDURA S.p.A. (IT) | 2002-07-10 | — | — | EP | disclosed |
| EP-0740213-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 2001-08-08 | — | — | EP | disclosed |
| WO-2001023339-A1 | PROCESS FOR THE SYNTHESIS OF 2-HYDROXYPHENYL ALKYL KETONES | ENDURA S.P.A. (IT) | 2001-04-05 | — | — | WO | disclosed |
| EP-0745575-B1 | Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound | FUJI PHOTO FILM CO LTD (JP) | 2000-09-06 | — | — | EP | disclosed |
| EP-0753795-B1 | Positive working photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0764884-B1 | Positive working photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1999-09-01 | — | — | EP | disclosed |
| US-5853949-A | Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound | FUJI PHOTO FILM CO., LTD. (JP) | 1998-12-29 | — | — | US | disclosed |
| US-5747218-A | NAPHTHOQUINONEDIAZIDE SULFONIC ACID TETRAESTER OF POLYHYDROXYPOLYPHENOLS | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-05 | — | — | US | disclosed |
| US-5709977-A | Positive working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-01-20 | — | — | US | disclosed |
| US-5667932-A | NAPHTHOQUINONEDIAZIDE SULFONIC ESTER OF POLYHYDROXY COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1997-09-16 | — | — | US | disclosed |
| US-5652081-A | PHENOLIC RESIN | FUJI PHOTO FILM CO., LTD. (JP) | 1997-07-29 | — | — | US | disclosed |
| EP-0764884-A2 | Positive working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-03-26 | — | — | EP | disclosed |
| EP-0753795-A1 | Positive working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0745575-A1 | Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound | FUJI PHOTO FILM CO., LTD. (JP) | 1996-12-04 | — | — | EP | disclosed |
| EP-0744661-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-11-27 | — | — | EP | disclosed |
| EP-0740213-A2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-10-30 | — | — | EP | disclosed |
| US-4163098-A | Coating compound based on epoxide resin, an amine curing agent, and a hydrazone modifier | CIBA-GEIGY CORPORATION (US) | 1979-07-31 | — | — | US | disclosed |