SCHEMBL65543

SCHEMBL65543

CC(OC(=O)c1ccccc1)N(C)C

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.55
TP53 P04637 1/20 0.55
PDCD1 Q15116 1/20 0.53
CD274 Q9NZQ7 1/20 0.53
LMNA P02545 3/20 0.50
NPC1 O15118 3/20 0.50
SMN1; SMN2 Q16637 3/20 0.50
ALDH1A1 P00352 2/20 0.50
HTT P42858 2/20 0.50
RAB9A P51151 2/20 0.50
F2 P00734 1/20 0.48
POLB P06746 1/20 0.48
PKM P14618 1/20 0.46
KMT2A Q03164 1/20 0.46
CYP1A2 P05177 2/20 0.45
CYP2D6 P10635 2/20 0.45
CYP2C19 P33261 1/20 0.45
SCN1A P35498 1/20 0.44
SCN2A Q99250 1/20 0.44
SCN3A Q9NY46 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11680205 0.84 TSHR (0.50) TSHRTP53PDCD1CD274LMNA
SCHEMBL28805216 0.83 TSHR (0.53) TSHRTP53PDCD1CD274LMNA
Benzoic Acid 1-Methylethyl Ester SCHEMBL31017505 0.82 PDCD1 (0.75) TSHRTP53PDCD1CD274LMNA
SCHEMBL6208815 0.81 PHLPP2 (0.50) TSHRPDCD1CD274LMNANPC1
SCHEMBL8519633 0.81 TSHR (0.52) TSHRTP53PDCD1CD274LMNA
SCHEMBL611039 0.80 PGR (0.57) TSHRTP53PDCD1CD274LMNA
SCHEMBL11677648 0.80 ALDH1A1 (0.52) TSHRLMNANPC1ALDH1A1CYP1A2
SCHEMBL10239104 0.79 TSHR (0.63) TSHRTP53PDCD1CD274LMNA
SCHEMBL6660758 0.79 TSHR (0.63) TSHRTP53PDCD1CD274LMNA
SCHEMBL13700339 0.79 TSHR (0.63) TSHRTP53PDCD1CD274LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 824 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119165729-A Photosensitive resist ink and preparation method of metal grid line 杭州福斯特电子材料有限公司 2024-12-20 CN claimed
CN-118599457-A Photo-thermal dual-curing transparent epoxy adhesive and preparation method and application thereof 华南理工大学 2024-09-06 CN claimed
CN-114805296-B Thioxanthone derivative, preparation method and application thereof 艾坚蒙(安庆)科技发展有限公司 2024-07-19 CN claimed
CN-118001165-A Dental resin composite material with Al-doped mesoporous silica as functional filler, and preparation method and application thereof 太原理工大学 2024-05-10 CN claimed
CN-115505380-B Composition with sulfur dissolving function without pungent odor, and preparation method and application thereof 中国石油化工股份有限公司 2024-02-20 CN claimed
CN-115505382-B Green low-toxicity composition with sulfur dissolving function and preparation method and application thereof 中国石油化工股份有限公司 2024-02-06 CN claimed
CN-116960233-A Patterning manufacturing method of quantum dot color conversion layer 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) 2023-10-27 CN claimed
CN-116725880-A Preparation method of enamel binding resin for open bite in orthodontic correction 杭州西湖生物材料有限公司 2023-09-12 CN claimed
CN-116314566-A Zinc metal negative electrode and zinc battery 广东工业大学 2023-06-23 CN claimed
CN-115960480-A Light response self-repairing material containing thymine derivative and application thereof 合肥工业大学 2023-04-14 CN claimed
CN-102311346-A Adamantane-containing resin as well as preparation method and application thereof UNIV CHANGZHOU 2012-01-11 CN claimed
CN-102120915-A Novel surface effect UV spraying coating and manufacture method thereof SHENZHEN SENSAI ER IND CO LTD 2011-07-13 CN claimed
CN-101928378-A Photosensitive resin and use thereof for preparing liquid photoimageable solder resist ink TAIZHOU XINHAN ELECTRONIC PRINTING INK CO LTD 2010-12-29 CN claimed
CN-101709179-A No-solvent ultraviolet curing glass printing ink and preparation method thereof HANGZHOU TOKA INK CHEMICAL CO 2010-05-19 CN claimed
CN-101007773-A Process for preparing ethyl p-dimethylaminobenzoate WU JIANLONG (CN) 2007-08-01 CN claimed
EP-1599743-A2 THREE-DIMENTIONAL DOSIMETER FOR PENETRATING RADIATION AND METHOD OF USE Heuris Pharma LLC (US) 2005-11-30 EP claimed
WO-2004079393-A2 THREE-DIMENTIONAL DOSIMETER FOR PENETRATING RADIATION AND METHOD OF USE HEURIS PHARMA LLC (US) 2004-09-16 WO claimed
CN-1398903-A Microemulsion synthesis process of metal-containing organic glass JIANG PINGPING (CN) 2003-02-26 CN claimed
US-4966916-A DI-AND TRIMETHYLAMINOETHYL BENZOATES, PHENYLCARBAMATES AND PHENYLTHIOCARBAMATES UNIVERSITY OF ROCHESTER 1990-10-30 US claimed
EP-0310304-A2 Visible light-curing polyester resin composition NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1989-04-05 EP claimed