SCHEMBL6557470

SCHEMBL6557470

NCCCCCCCCCCN.O=S(=O)(Cl)CCCCS(=O)(=O)Cl

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 5/20 0.44
TSHR P16473 3/20 0.44
LMNA P02545 3/20 0.44
CA12 O43570 2/20 0.44
CA1 P00915 2/20 0.44
CA2 P00918 2/20 0.44
CA3 P07451 2/20 0.44
CA4 P22748 2/20 0.44
CA6 P23280 2/20 0.44
CA5A P35218 2/20 0.44
CA7 P43166 2/20 0.44
CA9 Q16790 2/20 0.44
CA14 Q9ULX7 2/20 0.44
CA5B Q9Y2D0 2/20 0.44
BLM P54132 1/20 0.44
APP P05067 1/20 0.42
ALDH1A1 P00352 3/20 0.40
GMNN O75496 1/20 0.40
TP53 P04637 1/20 0.40
MAPK1 P28482 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6557464 1.00 DNM1 (0.44) DNM1TSHRLMNACA12CA1
SCHEMBL6831858 0.97
SCHEMBL10490994 0.88
SCHEMBL6557505 0.86 APP (0.43) DNM1TSHRLMNACA12CA1
SCHEMBL18110382 0.85 FAAH (0.35) CA2
SCHEMBL5880394 0.85 FAAH (0.35) CA2
SCHEMBL5903659 0.85 FAAH (0.35) CA2
SCHEMBL4107225 0.85 FAAH (0.35) CA2
SCHEMBL2263006 0.82 APLNR (0.32)
SCHEMBL11883063 0.77 DNM1 (0.50) DNM1TSHRLMNACA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0916394-B1 Method of manufacturing modified particles and manufacturing device therefor SHARP KK (JP) 2004-03-10 EP disclosed
US-6194487-B1 EXPOSURE OF PARTICLES TO SUPERSATURATED VAPOR OF MONOMERS, CONDENSATION AND POLYMERIZATION ON THE SURFACE SHARP KABUSHIKI KAISHA (JP) 2001-02-27 US disclosed
EP-0916394-A2 Method of manufacturing modified particles and manufacturing device therefor Sharp Kabushiki Kaisha (JP) 1999-05-19 EP disclosed