SCHEMBL6562825

SCHEMBL6562825

O=C(O)COc1ccc2ccccc2c1C(=O)O

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.66
HPGD P15428 3/20 0.66
KDM4E B2RXH2 2/20 0.66
TDP1 Q9NUW8 1/20 0.66
CTSD P07339 1/20 0.62
PTPN7 P35236 1/20 0.50
PRNP P04156 1/20 0.49
RXFP1 Q9HBX9 1/20 0.49
GLA P06280 2/20 0.49
HSD17B10 Q99714 2/20 0.49
MEN1 O00255 2/20 0.49
CYP1A2 P05177 2/20 0.49
CYP2C19 P33261 2/20 0.49
KMT2A Q03164 2/20 0.49
POLB P06746 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
ALOX15 P16050 1/20 0.46
CASP1 P29466 1/20 0.45
CASP3 P42574 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5404802 0.87 ALDH1A1 (0.52) ALDH1A1HPGDKDM4ETDP1CTSD
SCHEMBL10935027 0.87 ALDH1A1 (0.52) ALDH1A1HPGDKDM4ETDP1CTSD
SCHEMBL4799007 0.85 ALDH1A1 (0.50) ALDH1A1HPGDKDM4ETDP1CTSD
SCHEMBL2420501 0.85 ALDH1A1 (0.50) ALDH1A1HPGDKDM4ETDP1CTSD
SCHEMBL7928192 0.85 KDM4E (0.63) ALDH1A1HPGDKDM4ETDP1CTSD
SCHEMBL5491097 0.85 CTSD (0.64) ALDH1A1HPGDKDM4ETDP1CTSD
SCHEMBL503962 0.84 ALDH1A1 (0.61) ALDH1A1HPGDKDM4ECTSDGLA
SCHEMBL30393029 0.84 ALDH1A1 (0.61) ALDH1A1HPGDKDM4ECTSDGLA
SCHEMBL22169441 0.83 ALDH1A1 (0.70) ALDH1A1HPGDKDM4ETDP1CTSD
SCHEMBL29506888 0.83 ALDH1A1 (0.70) ALDH1A1HPGDKDM4ETDP1CTSD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6238842-B1 SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS FUJI PHOTO FILM CO., LTD. (JP) 2001-05-29 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed