SCHEMBL6562829

SCHEMBL6562829

O=C(O)C(Oc1ccc2ccccc2c1)C(=O)O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 6/20 0.60
PPARA Q07869 5/20 0.60
LDHA P00338 1/20 0.55
KMT2A Q03164 3/20 0.55
MEN1 O00255 2/20 0.55
PTPN7 P35236 1/20 0.55
MAPT P10636 1/20 0.55
TDP1 Q9NUW8 1/20 0.55
CYP1A2 P05177 1/20 0.47
CYP2A6 P11509 1/20 0.47
PPARD Q03181 2/20 0.47
CES2 O00748 1/20 0.45
CES1 P23141 1/20 0.45
ALDH1A1 P00352 2/20 0.45
KDM4E B2RXH2 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
AKR1C3 P42330 1/20 0.45
AKR1C2 P52895 1/20 0.45
HSD17B10 Q99714 1/20 0.45
HTT P42858 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28840586 0.81 PPARG (0.57) PPARGPPARAKMT2AMEN1PTPN7
SCHEMBL11424240 0.81 PPARG (0.57) PPARGPPARAKMT2AMEN1PTPN7
SCHEMBL2597632 0.81 CYP1A2 (0.66) PPARGPPARAKMT2AMEN1PTPN7
SCHEMBL20045393 0.81 CYP1A2 (0.66) PPARGPPARAKMT2AMEN1PTPN7
SCHEMBL30439101 0.81 PPARG (0.57) PPARGPPARAKMT2AMEN1PTPN7
SCHEMBL2560281 0.81 LDHA (0.65) PPARGPPARALDHACYP1A2
SCHEMBL21881839 0.79 KDM4E (0.64) PPARGPPARAKMT2AMEN1PTPN7
SCHEMBL9451283 0.79 MAPT (0.54) PPARGPPARAKMT2AMEN1PTPN7
SCHEMBL10760911 0.79 SCN7A (0.47) PPARGPPARALDHAPTPN7
SCHEMBL6380944 0.78 LDHA (0.62) PPARGPPARALDHACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6238842-B1 SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS FUJI PHOTO FILM CO., LTD. (JP) 2001-05-29 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed