SCHEMBL6563118

SCHEMBL6563118

[N-]=[N+]=C1C(=O)Oc2ccccc2C1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 1/20 0.55
MAOB P27338 1/20 0.55
ATM Q13315 2/20 0.40
HDAC3 O15379 1/20 0.38
HDAC4 P56524 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38
HDAC2 Q92769 1/20 0.38
HDAC10 Q969S8 1/20 0.38
HDAC11 Q96DB2 1/20 0.38
HDAC8 Q9BY41 1/20 0.38
HDAC6 Q9UBN7 1/20 0.38
HDAC9 Q9UKV0 1/20 0.38
HDAC5 Q9UQL6 1/20 0.38
CYP2C9 P11712 2/20 0.37
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
USP2 O75604 1/20 0.35
TSHR P16473 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7080531 0.74 MAOA (0.33) MAOAMAOBATMHDAC3HDAC4
SCHEMBL5544519 0.74 MAOA (0.68) MAOAMAOBATMHDAC3HDAC4
SCHEMBL5713260 0.73 MAOA (0.61) MAOAMAOBATMHDAC3HDAC4
SCHEMBL8869259 0.73 MAOA (0.61) MAOAMAOBATMHDAC3HDAC4
SCHEMBL29419966 0.72 MAOA (1.00) MAOAMAOBATMHDAC3HDAC4
SCHEMBL521775 0.72 MAOA (1.00) MAOAMAOBATMHDAC3HDAC4
SCHEMBL28681589 0.71 MAOA (0.95) MAOAMAOBATMHDAC3HDAC4
SCHEMBL2721424 0.69 MAOA (0.74) MAOAMAOBATMHDAC3HDAC4
SCHEMBL6522130 0.67 MAOA (0.52) MAOAMAOBATMHDAC3HDAC4
SCHEMBL25424957 0.66 MAOA (0.68) MAOAMAOBATMHDAC3HDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109134444-B 3- (2-furan) -4-hydroxycoumarin compound, preparation method thereof and application thereof in resisting plant fungi 陕西师范大学 2021-07-23 CN disclosed
EP-0996870-B1 IMPROVED DISSOLUTION INHIBITION RESISTS FOR MICROLITHOGRAPHY DU PONT (US) 2004-03-24 EP disclosed
US-6319648-B1 USED FOR IMAGING MATERIALS OF SEMICONDUCTOR DEVICE E. I. DU PONT DE NEMOURS AND COMPANY 2001-11-20 US disclosed
EP-0996870-A1 IMPROVED DISSOLUTION INHIBITION RESISTS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2000-05-03 EP disclosed
WO-1999004319-A1 IMPROVED DISSOLUTION INHIBITION RESISTS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 1999-01-28 WO disclosed