SCHEMBL6563571

SCHEMBL6563571

O=C(O)COc1cccc2c(C(=O)O)cccc12

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.65
ALDH1A1 P00352 4/20 0.65
HPGD P15428 2/20 0.65
TDP1 Q9NUW8 1/20 0.65
HTT P42858 1/20 0.51
L3MBTL1 Q9Y468 2/20 0.50
POLB P06746 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
GLA P06280 1/20 0.50
PTGDR2 Q9Y5Y4 1/20 0.47
NR4A1 P22736 1/20 0.47
NR4A2 P43354 1/20 0.47
NR4A3 Q92570 1/20 0.47
CASP1 P29466 1/20 0.45
HSD17B10 Q99714 1/20 0.45
KMT2A Q03164 2/20 0.45
PTK2B Q14289 1/20 0.45
CNR2 P34972 1/20 0.45
ALOX15 P16050 1/20 0.44
TRPM4 Q8TD43 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6564798 0.90 KDM4E (0.60) KDM4EALDH1A1HPGDTDP1HTT
SCHEMBL28442586 0.83 LMNA (0.50) KDM4EHTTL3MBTL1GLANR4A1
SCHEMBL29502958 0.82 KDM4E (0.73) KDM4EALDH1A1HPGDTDP1HTT
SCHEMBL341639 0.82 KDM4E (0.73) KDM4EALDH1A1HPGDTDP1HTT
Naphthyloxyacetic Acid SCHEMBL6820182 0.81 KDM4E (0.96) KDM4EALDH1A1HPGDTDP1HTT
SCHEMBL5846509 0.81 KMT2A (0.53) KDM4EALDH1A1HPGDTDP1HTT
SCHEMBL10959997 0.81 KDM4E (0.67) KDM4EALDH1A1HPGDTDP1L3MBTL1
SCHEMBL10960208 0.80 CNR2 (0.63) KDM4EALDH1A1NR4A1NR4A2NR4A3
Naphthyloxyacetic Acid SCHEMBL120838 0.79 KDM4E (1.00) KDM4EALDH1A1HPGDTDP1HTT
Naphthyloxyacetic Acid SCHEMBL29364154 0.79 KDM4E (1.00) KDM4EALDH1A1HPGDTDP1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6238842-B1 SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS FUJI PHOTO FILM CO., LTD. (JP) 2001-05-29 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed