SCHEMBL6563613

SCHEMBL6563613

O=C(O)COc1cc(C(=O)O)cc2ccccc12

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.64
ALDH1A1 P00352 3/20 0.64
HPGD P15428 2/20 0.64
TDP1 Q9NUW8 1/20 0.64
CTSD P07339 1/20 0.51
DAPK1 P53355 1/20 0.50
PIM3 Q86V86 1/20 0.50
MRGPRX4 Q96LA9 1/20 0.49
PTPN7 P35236 1/20 0.49
MAPT P10636 1/20 0.47
PKM P14618 1/20 0.47
GLA P06280 2/20 0.46
POLB P06746 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
ALOX15 P16050 1/20 0.44
PTGDR2 Q9Y5Y4 4/20 0.44
MEN1 O00255 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP2C19 P33261 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20515885 0.84 TSHR (0.53) KDM4EALDH1A1HPGDTDP1DAPK1
SCHEMBL9108912 0.84 MRGPRX4 (0.49) KDM4EALDH1A1HPGDTDP1DAPK1
SCHEMBL30696120 0.83 MRGPRX4 (0.66) ALDH1A1HPGDMRGPRX4MAPTSMN1; SMN2
SCHEMBL6959477 0.83 MRGPRX4 (0.66) ALDH1A1HPGDMRGPRX4MAPTSMN1; SMN2
SCHEMBL6564724 0.83 KDM4E (0.67) KDM4EALDH1A1HPGDTDP1DAPK1
SCHEMBL20515855 0.81 MRGPRX4 (0.46) KDM4EALDH1A1HPGDTDP1CTSD
SCHEMBL7768998 0.80 MRGPRX4 (0.45) KDM4EALDH1A1HPGDTDP1DAPK1
SCHEMBL20515873 0.80 PDE4B (0.46) KDM4EALDH1A1HPGDTDP1DAPK1
SCHEMBL13132193 0.80 MRGPRX4 (0.45) KDM4EALDH1A1HPGDDAPK1PIM3
SCHEMBL8089490 0.80 PLA2G2A (0.52) ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6238842-B1 SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS FUJI PHOTO FILM CO., LTD. (JP) 2001-05-29 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed