SCHEMBL6564442

SCHEMBL6564442

CC(O[SiH3])c1cccc(C#Cc2ccccc2)c1C#Cc1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 4/20 0.39
▸ SMN1; SMN2 Q16637 3/20 0.39
▸ MEN1 O00255 3/20 0.39
▸ ALDH1A1 P00352 3/20 0.39
▸ CYP1A2 P05177 3/20 0.39
▸ CYP3A4 P08684 3/20 0.39
▸ CYP2C9 P11712 3/20 0.39
▸ HPGD P15428 3/20 0.39
▸ CYP2C19 P33261 3/20 0.39
▸ KMT2A Q03164 3/20 0.39
▸ MAPT P10636 3/20 0.39
▸ KDM4E B2RXH2 2/20 0.39
▸ HSD17B10 Q99714 2/20 0.39
▸ APP P05067 1/20 0.36
▸ RAB9A P51151 3/20 0.34
▸ KCNH2 Q12809 1/20 0.34
▸ CA12 O43570 1/20 0.34
▸ CA2 P00918 1/20 0.34
▸ CA9 Q16790 1/20 0.34
▸ DHFR P00374 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3797526 0.74 APP (0.60) NPC1SMN1; SMN2MEN1ALDH1A1CYP1A2
SCHEMBL6564331 0.71 — —
SCHEMBL5929499 0.71 APP (0.50) NPC1SMN1; SMN2MEN1ALDH1A1CYP1A2
SCHEMBL28282150 0.71 NPC1 (0.50) NPC1SMN1; SMN2MEN1ALDH1A1CYP1A2
SCHEMBL29066977 0.70 CYP1A1 (0.31) CYP1A2
SCHEMBL9154580 0.70 NPC1 (0.48) NPC1SMN1; SMN2MEN1ALDH1A1CYP1A2
SCHEMBL6564096 0.69 MAPT (0.41) NPC1SMN1; SMN2MEN1ALDH1A1CYP1A2
SCHEMBL3792911 0.68 APP (0.63) NPC1SMN1; SMN2MEN1ALDH1A1CYP1A2
SCHEMBL2114742 0.65 APP (0.75) NPC1SMN1; SMN2MEN1ALDH1A1CYP1A2
SCHEMBL5871989 0.65 APP (0.75) NPC1SMN1; SMN2MEN1ALDH1A1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 — — EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 — — US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 — — US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 — — EP disclosed
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