SCHEMBL6564458

SCHEMBL6564458

CC(=O)O[SiH](OC(C)=O)c1ccccc1C#Cc1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.45
RAB9A P51151 1/20 0.45
KDM4E B2RXH2 3/20 0.41
ALDH1A1 P00352 3/20 0.41
LMNA P02545 2/20 0.41
FFAR1 O14842 12/20 0.40
MEN1 O00255 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
MAPT P10636 1/20 0.40
CYP2C9 P11712 1/20 0.40
HPGD P15428 1/20 0.40
CYP2C19 P33261 1/20 0.40
KMT2A Q03164 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
HSD17B10 Q99714 1/20 0.40
CA12 O43570 1/20 0.38
CA2 P00918 1/20 0.38
CA9 Q16790 1/20 0.38
CHRM2 P08172 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6564250 0.78 ALDH1A1 (0.46) NPC1RAB9AKDM4EALDH1A1LMNA
SCHEMBL6562841 0.74 NPC1 (0.42) NPC1RAB9AKDM4EALDH1A1LMNA
SCHEMBL3946305 0.72 KDM4E (0.51) NPC1RAB9AKDM4EALDH1A1LMNA
SCHEMBL28666492 0.72 NPC1 (0.50) NPC1RAB9AKDM4EALDH1A1LMNA
SCHEMBL4281366 0.71 ALDH1A1 (0.38) NPC1RAB9AKDM4EALDH1A1LMNA
Diphenylacetylene SCHEMBL27967498 0.70 APP (0.52) NPC1RAB9AKDM4EALDH1A1LMNA
SCHEMBL28690161 0.69 NPC1 (0.68) NPC1RAB9AKDM4EALDH1A1LMNA
Acetic Acid SCHEMBL28454105 0.69 FFAR1 (0.59) NPC1RAB9AKDM4EALDH1A1LMNA
SCHEMBL16011951 0.68 GABRA1 (0.38) ALDH1A1LMNAMAPTNPSR1L3MBTL1
SCHEMBL204167 0.68 ALDH1A1 (0.42) KDM4EALDH1A1LMNACYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed