⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12801706 | 0.83 | — | — | |
| SCHEMBL607515 | 0.80 | — | — | |
| SCHEMBL8237341 | 0.79 | KDM4C (0.47) | — | |
| SCHEMBL13561304 | 0.79 | ALDH1A1 (0.35) | — | |
| SCHEMBL11519344 | 0.79 | ALDH1A1 (0.41) | — | |
| SCHEMBL11518651 | 0.76 | CNR1 (0.38) | — | |
| SCHEMBL15268118 | 0.76 | — | — | |
| SCHEMBL2735472 | 0.76 | RIPK1 (0.52) | — | |
| SCHEMBL4909595 | 0.76 | — | — | |
| SCHEMBL25848647 | 0.75 | EPHX1 (0.53) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040081922-A1 | Photoresist stripper composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-04-29 | — | — | US | disclosed |
| EP-1400858-A1 | PHOTORESIST STRIPPER COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-03-24 | — | — | EP | disclosed |