Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 3/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | ESR1 | P03372 | 3/20 | 0.31 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL647892 | 0.94 | BRD4 (0.32) | ELANE | |
| Trifluoromethanesulfonic Acid SCHEMBL6566214 | 0.89 | HSD17B10 (0.34) | GAAALDH1A1SMN1; SMN2ESR1ESR2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6566368 | 0.86 | TYMS (0.38) | GAAALDH1A1SMN1; SMN2ESR1ESR2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564688 | 0.86 | GAA (0.32) | GAAALDH1A1SMN1; SMN2ESR1ESR2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6566199 | 0.85 | ELANE (0.36) | GAAALDH1A1SMN1; SMN2ELANE | |
| SCHEMBL3158517 | 0.84 | — | — | |
| SCHEMBL3161098 | 0.83 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6564792 | 0.83 | ELANE (0.44) | SMN1; SMN2KMT2AELANE | |
| SCHEMBL3870709 | 0.83 | ELANE (0.36) | GAAALDH1A1SMN1; SMN2MEN1KMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL646438 | 0.83 | KDM4E (0.34) | ESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |