Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6566199

CCCOC(=O)Oc1cccc2c([S+]3CCCC3)cccc12.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.36

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Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.36
MMP2 P08253 1/20 0.33
MMP9 P14780 1/20 0.33
MMP14 P50281 1/20 0.33
KCNH2 Q12809 6/20 0.31
TYMS P04818 1/20 0.31
ACHE P22303 2/20 0.31
BCHE P06276 1/20 0.31
RXFP1 Q9HBX9 1/20 0.31
ALDH1A1 P00352 1/20 0.30
GAA P10253 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
PDK2 Q15119 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6564792 0.94 ELANE (0.44) ELANEKCNH2ACHEBCHERXFP1
Trifluoromethanesulfonic Acid SCHEMBL646751 0.94 MMP2 (0.33) ELANEMMP2MMP9MMP14TYMS
Trifluoromethanesulfonic Acid SCHEMBL6566368 0.92 TYMS (0.38) ELANEMMP2MMP9MMP14KCNH2
Trifluoromethanesulfonic Acid SCHEMBL645685 0.88 ELANE (0.40) ELANEKCNH2ACHEBCHERXFP1
Trifluoromethanesulfonic Acid SCHEMBL6566214 0.86 HSD17B10 (0.34) ELANEACHEALDH1A1GAASMN1; SMN2
Trifluoromethanesulfonic Acid SCHEMBL645884 0.86 TYMS (0.38) MMP2MMP9MMP14TYMSALDH1A1
Trifluoromethanesulfonic Acid SCHEMBL6566070 0.85 KMT2A (0.38) KCNH2ACHEBCHERXFP1
SCHEMBL3149411 0.85 MMP2 (0.31) MMP2MMP9MMP14
Trifluoromethanesulfonic Acid SCHEMBL6564876 0.85 GAA (0.32) ELANEALDH1A1GAASMN1; SMN2
SCHEMBL3150432 0.84 MMP2 (0.30) MMP2MMP9MMP14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed