SCHEMBL6567006

SCHEMBL6567006

C=CN1CC(CCC)CC1=O

nearest known ligand 0.40

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
BRD4 O60885 2/20 0.40
NOS3 P29474 2/20 0.31
NOS1 P29475 2/20 0.31
NOS2 P35228 2/20 0.31
FYN P06241 1/20 0.31
KMT2A Q03164 1/20 0.31
PIK3CD O00329 1/20 0.30
PIK3CA P42336 1/20 0.30
PIK3CB P42338 1/20 0.30
PIK3CG P48736 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6569044 0.90 BRD4 (0.38) BRD4KMT2A
SCHEMBL631765 0.85 BRD4 (0.36) BRD4
SCHEMBL1618413 0.83 OPRM1 (0.33) BRD4FYNPIK3CDPIK3CAPIK3CB
SCHEMBL5164171 0.80 NOS3 (0.33) NOS3NOS1NOS2KMT2A
SCHEMBL7238106 0.80 OPRM1 (0.34) FYNPIK3CDPIK3CAPIK3CBPIK3CG
SCHEMBL6741387 0.78 BRD4 (0.53) BRD4
SCHEMBL3464079 0.78 FAAH (0.37) BRD4
SCHEMBL27507424 0.78 BRD4 (0.32) BRD4
SCHEMBL2331422 0.76 BRD4 (0.43) BRD4NOS3NOS1NOS2FYN
SCHEMBL9353676 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113677719-B Modified high cis polydiene polymers, related methods and rubber compositions 株式会社普利司通 2024-12-27 CN claimed
US-12168705-B2 Modified high cis polydiene polymer, related methods and rubber compositions BRIDGESTONE CORPORATION (JP) 2024-12-17 US claimed
EP-3938412-B1 MODIFIED HIGH CIS POLYDIENE POLYMER, RELATED METHODS AND RUBBER COMPOSITIONS BRIDGESTONE CORP (JP) 2024-04-24 EP claimed
US-20220185931-A1 Modified High Cis Polydiene Polymer, Related Methods And Rubber Compositions BRIDGESTONE CORPORATION (JP) 2022-06-16 US claimed
EP-3938412-A1 MODIFIED HIGH CIS POLYDIENE POLYMER, RELATED METHODS AND RUBBER COMPOSITIONS BRIDGESTONE CORPORATION (JP) 2022-01-19 EP claimed
CN-113677719-A Modified high-cis polydiene polymers, related methods, and rubber compositions 株式会社普利司通 2021-11-19 CN claimed
US-11161927-B2 Functionalized polymer, process for preparing and rubber compositions containing the functionalized polymer BRIDGESTONE CORPORATION (JP) 2021-11-02 US claimed
EP-3388455-B1 VINYL CHLORIDE-BASED COPOLYMER, PROCESS FOR PRODUCING SAME, AND THERMOPLASTIC RESIN COMPOSITION COMPRISING SAME LG CHEMICAL LTD (KR) 2021-04-28 EP claimed
WO-2020185761-A1 MODIFIED HIGH CIS POLYDIENE POLYMER, RELATED METHODS AND RUBBER COMPOSITIONS BRIDGESTONE CORPORATION (JP) 2020-09-17 WO claimed
CN-107207668-B Vinyl chloride-based copolymer, method for producing same, and thermoplastic resin composition containing same 株式会社LG化学 2020-04-24 CN claimed
US-6262222-B1 STABILITY; FOR MICROLITHOGRAPHY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-07-17 US claimed
EP-4541828-A1 N-VINYL LACTAM COPOLYMER AND COMPOSITION Nippon Shokubai Co., Ltd. (JP) 2025-04-23 EP disclosed
CN-113677719-B Modified high cis polydiene polymers, related methods and rubber compositions 株式会社普利司通 2024-12-27 CN disclosed
US-12168705-B2 Modified high cis polydiene polymer, related methods and rubber compositions BRIDGESTONE CORPORATION (JP) 2024-12-17 US disclosed
EP-3938412-B1 MODIFIED HIGH CIS POLYDIENE POLYMER, RELATED METHODS AND RUBBER COMPOSITIONS BRIDGESTONE CORP (JP) 2024-04-24 EP disclosed
US-6262222-B1 STABILITY; FOR MICROLITHOGRAPHY HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-07-17 US disclosed
EP-1101625-A2 Receiving sheet for ink-jet printing comprising a copolymer FERRANIA S.p.A. (IT) 2001-05-23 EP disclosed
US-6051678-A A PHOTOTRESIST COPOLYMER COMPRISING N-VINYLLACTAM DERIVATIVE BLOCKED BY A PROTECTING GROUP, WHERE THE PROTECTING GROUP IS DECOMPOSED BY AN ACID TO BE A FUNCTIONAL GROUP SOLUBLE IN AN ALKALINE DEVELOPER HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-04-18 US disclosed
US-5955606-A PHOTORESISTS OF POLYVINYLLACTAMS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 1999-09-21 US disclosed
US-5750680-A BLOCKED AT 3-POSITION; FOR USE IN MICROLITHOGRAPHY OF SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 1998-05-12 US disclosed