Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.51 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.51 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | MMP2 | P08253 | 2/20 | 0.46 |
| ▸ | MMP9 | P14780 | 2/20 | 0.46 |
| ▸ | MMP12 | P39900 | 2/20 | 0.46 |
| ▸ | MMP1 | P03956 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | ELANE | P08246 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7475347 | 0.78 | TDP1 (0.50) | TDP1KMT2ASLC6A2SLC6A3ALDH1A1 | |
| SCHEMBL10899341 | 0.77 | TDP1 (0.53) | TDP1KMT2ASLC6A2SLC6A3ALDH1A1 | |
| SCHEMBL10599688 | 0.71 | TDP1 (0.46) | TDP1KMT2ASLC6A2SLC6A3ALDH1A1 | |
| SCHEMBL30629170 | 0.71 | MAOA (0.44) | TDP1KMT2ASLC6A2SLC6A3LMNA | |
| SCHEMBL6984392 | 0.70 | TDP1 (0.51) | TDP1KMT2ASLC6A2SLC6A3ALDH1A1 | |
| Benzyl Benzoate SCHEMBL27990934 | 0.70 | KMT2A (0.92) | TDP1KMT2ASLC6A2SLC6A3ALDH1A1 | |
| SCHEMBL9658266 | 0.70 | TDP1 (0.66) | TDP1KMT2ASLC6A2SLC6A3ALDH1A1 | |
| SCHEMBL6402746 | 0.69 | TDP1 (0.59) | TDP1KMT2ASLC6A2SLC6A3ALDH1A1 | |
| Benzyl Benzoate SCHEMBL8010992 | 0.69 | KMT2A (1.00) | TDP1KMT2ASLC6A2SLC6A3ALDH1A1 | |
| SCHEMBL50441 | 0.69 | ALDH1A1 (0.89) | TDP1KMT2ASLC6A2SLC6A3ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1724119-A1 | DEVELOPER MIXTURE FOR THERMAL RECORDING MATERIALS AND THERMAL RECORDING MATERIALS | API Corporation (JP) | 2006-11-22 | — | — | EP | claimed |
| US-4598035-A | LEUCO AND DISAZO DYES | FUJI PHOTO FILM CO., LTD. (JP) | 1986-07-01 | — | — | US | claimed |
| US-4533929-A | ANIONIC SURFACTANTS AS ANTIFOGGING AGENTS; DIETHYLHEXYL SULFOSUCCINATE | FUJI PHOTO FILM CO., LTD. (JP) | 1985-08-06 | — | — | US | claimed |
| JP-58022197-A | — | — | None | — | — | JP | disclosed |
| JP-58122893-A | — | — | None | — | — | JP | disclosed |
| JP-58185292-A | — | — | None | — | — | JP | disclosed |
| JP-58177391-A | — | — | None | — | — | JP | disclosed |
| US-20240189215-A1 | FILM-FORMING COMPOSITION | KAO CORPORATION (JP) | 2024-06-13 | — | — | US | disclosed |
| US-20240124810-A1 | SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2024-04-18 | — | — | US | disclosed |
| US-20230313069-A1 | SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230313080-A1 | SURFACE TREATMENT COMPOSITION | FUJIMI INCORPORATED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-4520378-A | Heat-sensitive recording paper and a process for production thereof | MITSUBISHI PAPER MILLS, LTD. (JP) | 1985-05-28 | — | — | US | disclosed |
| EP-0133182-A1 | OXIDATION-REDUCTION COLOR PRODUCTION-TYPE HEAT-SENSITIVE RECORDING UNIT | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1985-02-20 | — | — | EP | disclosed |
| US-4479138-A | PHENYL BENZOIC ESTER TO INCREASE SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 1984-10-23 | — | — | US | disclosed |
| US-4467338-A | 1,1,3-TRIS(O-TERTIARYBUTYL-4-HYDROXY-6-METHYLPHENYL)BUTANE AS STABILIZER | MITSUBISHI PAPER MILLS, LTD. (JP) | 1984-08-21 | — | — | US | disclosed |
| US-4467336-A | SUSPERCALENDING TO CONTROL MOISTURE TO OBTAIN MAXIMUM PEAK OF VOID DISTRIBUTION CURVE | MITSUBISHI PAPER MILLS, LTD. (JP) | 1984-08-21 | — | — | US | disclosed |
| JP-S58185292-A | HEAT-SENSITIVE RECORDING SHEET HAVING IMPROVED CHROMOGENIC SENSITIVITY | MITSUBISHI PAPER MILLS LTD | 1983-10-28 | — | — | JP | disclosed |
| JP-S58177391-A | HEAT-SENSITIVE RECORDING SHEET | RICOH CO LTD | 1983-10-18 | — | — | JP | disclosed |
| JP-S58122893-A | HEAT-SENSITIVE RECORDING TYPE RELEASABLE PAPER | RICOH CO LTD | 1983-07-21 | — | — | JP | disclosed |
| JP-S5822197-A | HEAT-SENSITIVE RECORDING MATERIAL | RICOH CO LTD | 1983-02-09 | — | — | JP | disclosed |